N.G. Nakhodkin & T.V. Rodionova. Possibility of Application of Topological Consideration for Grain Boundaries in Nanosilicon Films. Sumy State University.
Chicago Style (17th ed.) CitationN.G. Nakhodkin and T.V. Rodionova. Possibility of Application of Topological Consideration for Grain Boundaries in Nanosilicon Films. Sumy State University.
MLA (9th ed.) CitationN.G. Nakhodkin and T.V. Rodionova. Possibility of Application of Topological Consideration for Grain Boundaries in Nanosilicon Films. Sumy State University.
Warning: These citations may not always be 100% accurate.