APA (7th ed.) Citation

Chang, T., Chang, C., Chu, Y., Lee, C., Chang, J., Chen, I., & Li, T. T. Low Temperature (180°C) Growth of Smooth Surface Germanium Epilayers on Silicon Substrates Using Electron Cyclotron Resonance Chemical Vapor Deposition. Wiley.

Chicago Style (17th ed.) Citation

Chang, Teng-Hsiang, Chiao Chang, Yen-Ho Chu, Chien-Chieh Lee, Jenq-Yang Chang, I-Chen Chen, and Tomi T. Li. Low Temperature (180°C) Growth of Smooth Surface Germanium Epilayers on Silicon Substrates Using Electron Cyclotron Resonance Chemical Vapor Deposition. Wiley.

MLA (9th ed.) Citation

Chang, Teng-Hsiang, et al. Low Temperature (180°C) Growth of Smooth Surface Germanium Epilayers on Silicon Substrates Using Electron Cyclotron Resonance Chemical Vapor Deposition. Wiley.