High Reflectivity YDH/SiO2 Distributed Bragg Reflector for UV-C Wavelength Regime
A distributed Bragg reflector (DBR) composed of Y<sub>2</sub>O<sub>3</sub>-doped HfO<sub>2</sub> (YDH)/SiO<sub>2</sub> layers with high reflectivity spectrum centered at a wavelength of ∼240 nm is fabricated using radio-frequency...
Saved in:
| Main Authors: | , , , , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2018-01-01
|
| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/8290666/ |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | A distributed Bragg reflector (DBR) composed of Y<sub>2</sub>O<sub>3</sub>-doped HfO<sub>2</sub> (YDH)/SiO<sub>2</sub> layers with high reflectivity spectrum centered at a wavelength of ∼240 nm is fabricated using radio-frequency magnetron sputtering. Before the DBR deposition, optical properties for a single layer of YDH, SiO<sub>2</sub>, and HfO<sub>2</sub> thin films were studied using spectroscopic ellipsometry and spectrophotometry. To investigate the performance of YDH as a material for the high refractive index layer in the DBR, a comparison of its optical properties was made with HfO<sub>2</sub> thin films. Due to larger optical bandgap, the YDH thin films demonstrated higher transparency, lower extinction coefficient, and lower absorption coefficient in the UV-C regime (especially for wavelengths below 250 nm) compared to the HfO<sub>2</sub> thin films. The fabricated YDH/SiO<sub>2 </sub> DBR consisting of 15 periods achieved a reflectivity higher than 99.9% at the wavelength of ∼240 nm with a stopband of ∼50 nm. The high reflectivity and broad stopband of YDH/SiO<sub>2</sub> DBRs will enable further advancement of various photonic devices such as vertical-cavity surface-emitting lasers, resonant-cavity light-emitting diodes, and resonant-cavity photodetectors operating in the UV-C wavelength regime. |
|---|---|
| ISSN: | 1943-0655 |