Research on the application of thermal field emission gun in electron beam lithography
The classification and characteristics of electron gun are introduced, with emphasis on the principle, structure and characteristics of thermal field emission gun and its application in electron beam lithography machine. The relationship between the beam current of the electron beam lithography mach...
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| Main Authors: | Hao Xiaoliang, Zhao Yingwei, Sun Hu, Wang Xiuhai, Cao Jian, Ma Peisheng, Ren Zesheng |
|---|---|
| Format: | Article |
| Language: | zho |
| Published: |
National Computer System Engineering Research Institute of China
2022-04-01
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| Series: | Dianzi Jishu Yingyong |
| Subjects: | |
| Online Access: | http://www.chinaaet.com/article/3000148317 |
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