Tellier, C. R., Hodebourg, C. A., & Durand, S. Some Investigations on the Anisotropy of the Chemical Etching of (h k 0) and (h h l) Silicon Plates in a NaOH 35% Solution. Part II: 3D Etching Shapes, Analysis and Comparison with KOH 56%. Wiley.
Chicago Style (17th ed.) CitationTellier, C. R., C. A. Hodebourg, and S. Durand. Some Investigations on the Anisotropy of the Chemical Etching of (h K 0) and (h H L) Silicon Plates in a NaOH 35% Solution. Part II: 3D Etching Shapes, Analysis and Comparison with KOH 56%. Wiley.
MLA (9th ed.) CitationTellier, C. R., et al. Some Investigations on the Anisotropy of the Chemical Etching of (h K 0) and (h H L) Silicon Plates in a NaOH 35% Solution. Part II: 3D Etching Shapes, Analysis and Comparison with KOH 56%. Wiley.
Warning: These citations may not always be 100% accurate.