Loupis, M. I., Avaritsiotis, J. N., & Tziallas, G. D. Comparative Study of Statistical Distributions in Electromigration-Induced Failures of Al/Cu Thin-Film Interconnects. Wiley.
Chicago Style (17th ed.) CitationLoupis, M. I., J. N. Avaritsiotis, and G. D. Tziallas. Comparative Study of Statistical Distributions In Electromigration-Induced Failures of Al/Cu Thin-Film Interconnects. Wiley.
MLA (9th ed.) CitationLoupis, M. I., et al. Comparative Study of Statistical Distributions In Electromigration-Induced Failures of Al/Cu Thin-Film Interconnects. Wiley.
Warning: These citations may not always be 100% accurate.