Characterization of ion track-etched conical nanopores in thermal and PECVD SiO2 using small angle X-ray scattering
Conical nanopores in amorphous SiO2 thin films fabricated using the ion track etching technique show promising potential for filtration, sensing, and nanofluidic applications. The characterization of the pore morphology and size distribution, along with its dependence on the material properties and...
Saved in:
| Main Authors: | Shankar Dutt, Rudradeep Chakraborty, Christian Notthoff, Pablo Mota-Santiago, Christina Trautmann, Patrick Kluth |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Beilstein-Institut
2025-06-01
|
| Series: | Beilstein Journal of Nanotechnology |
| Subjects: | |
| Online Access: | https://doi.org/10.3762/bjnano.16.68 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
RESEARCH PROCESS PLASMA ETCHING SIO2 MEMBRANE
by: T. A. Ismailov, et al.
Published: (2016-07-01) -
Dry etch performance of Novolak-based negative e-beam resist
by: Rahul Singh, et al.
Published: (2024-12-01) -
Enhanced etch characteristics of EUV PR masked SiON through the ion beam grid pulsing technique
by: Hae In Kwon, et al.
Published: (2025-06-01) -
Comparison of the clinical parameters of restorations performed with total-etch and self-etch adhesive techniques
by: Z. S. Khabadze, et al.
Published: (2024-04-01) -
Effect of photo chemical etching and electro chemical etching on the topography of porous silicon wafers surfaces
by: Amjad Hussein Jassem
Published: (2019-08-01)