Diamond etching with near-zero micromasking
The outstanding material properties of single-crystal diamond have been the origin of the long-standing interest in its exploitation for engineering of high-performance micro- and nanosystems. Etching and patterning diamond have proven challenging due to the hardness and chemical resistance of the m...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2024-11-01
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| Series: | Journal of Materials Research and Technology |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2238785424025390 |
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| Summary: | The outstanding material properties of single-crystal diamond have been the origin of the long-standing interest in its exploitation for engineering of high-performance micro- and nanosystems. Etching and patterning diamond have proven challenging due to the hardness and chemical resistance of the material. In this work, the patterned etching process of single-crystal diamond has been investigated using the inductively coupled plasma etching technique. In order to avoid the micromasking phenomenon caused by the metal mask, this paper adopts the Ar/O2–Ar/Cl2/BCl3 two-step cycle etching process and investigates the effect of the Cl2/BCl3 gas ratio on the bottom morphology of single-crystal diamond grid grooves. A theoretical explanation is provided for the use of chlorine-based gases to eliminate micromasking and achieve a smooth etching surface. Finally, an Ar/O₂-Ar/Cl₂/BCl3 cyclic etching process for patterning single-crystal diamond with near-zero micromasking has been developed. |
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| ISSN: | 2238-7854 |