Features of Formation of Ohmic Contacts and Gate on Epitaxial Heterostructure of AlGaN / GaN High Electron Mobility Transistor

Reported about study of processes of formation of Ti / Al / Ni / Au ohmic contacts to heterostructures AlGaN / GaN and gate Ni / Au. Investigated of process recess the semiconductor layer for minimum resistance of ohmic contact – 0.4 Ohm·mm. Studied influence of encapsulation ohmic contacts on their...

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Bibliographic Details
Main Authors: I.A. Rogachev, A.V. Knyazkov, O.I. Meshkov, A.S. Kurochka
Format: Article
Language:English
Published: Sumy State University 2016-06-01
Series:Журнал нано- та електронної фізики
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Online Access:http://jnep.sumdu.edu.ua/download/numbers/2016/2/articles/jnep_2016_V8_02044.pdf
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