A High-Density 4H-SiC MOSFET Based on a Buried Field Limiting Ring with Low Q<sub>gd</sub> and R<sub>on</sub>

In this study, we propose an optimized shield gate trench 4H-SiC structure with effective gate oxide protection. The proposed device has a split trench with a P+ shield region, and the P+ shield is grounded by the middle deep trench. Our simulation results show that the peak electric field near the...

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Bibliographic Details
Main Authors: Wenrong Cui, Jianbin Guo, Hang Xu, David Wei Zhang
Format: Article
Language:English
Published: MDPI AG 2025-04-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/16/4/447
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