Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone
We investigated the removal of polymers with various chemical structures and the removal of ion-implanted resists using wet ozone. The removal rates of polymers that have carbon-carbon (C–C) double bonds in the main chain were high. The main chain of these polymers may be decomposed. The removal rat...
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Main Authors: | Hideo Horibe, Yousuke Goto |
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Format: | Article |
Language: | English |
Published: |
Wiley
2012-01-01
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Series: | International Journal of Polymer Science |
Online Access: | http://dx.doi.org/10.1155/2012/937928 |
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