17.6% Conversion Efficiency Multicrystalline Silicon Solar Cells Using the Reactive Ion Etching with the Damage Removal Etching

17.6% Conversion Efficiency Multicrystalline Silicon Solar Cells Using the Reactive Ion Etching with the Damage Removal Etching

For lower reflectance, we applied a maskless plasma texturing technique using reactive ion etching (RIE) on acidic-textured multicrystalline silicon (mc-Si) wafer. RIE texturing had a deep and narrow textured surface and showed excellent low reflectance. Due to plasma-induced damage, unless the RIE-...

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Bibliographic Details
Main Authors: Ji-Myung Shim, Hyun-Woo Lee, Kyeong-Yeon Cho, Jae-Keun Seo, Ji-Soo Kim, Eun-Joo Lee, Jun-Young Choi, Dong-Joon Oh, Jeong-Eun Shin, Ji-Sun Kim, Ji-Hyun Kong, Soo-Hong Lee, Hae-Seok Lee
Format: Article
Language:English
Published: Wiley 2012-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2012/248182
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