Fabrication of Cu–Zn–Sn–S–O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells
A new multinary semiconductor Cu2ZnSnS4−𝑥O𝑥 (CZTSO), which does not contain toxic elements and expensive rare metals, was fabricated by the electrochemical deposition (ECD) method. CZTSO thin films were deposited onto indium tin oxide (ITO-) coated glass substrates by DC and two-step pulsed ECD from...
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| Format: | Article |
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Wiley
2012-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2012/154704 |
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| author | Kai Yang Masaya Ichimura |
| author_facet | Kai Yang Masaya Ichimura |
| author_sort | Kai Yang |
| collection | DOAJ |
| description | A new multinary semiconductor Cu2ZnSnS4−𝑥O𝑥 (CZTSO), which does not contain toxic elements and expensive rare metals, was fabricated by the electrochemical deposition (ECD) method. CZTSO thin films were deposited onto indium tin oxide (ITO-) coated glass substrates by DC and two-step pulsed ECD from aqueous solutions containing CuSO4, ZnSO4, SnSO4, and Na2S2O3. The films deposited by pulsed ECD contained smaller amount of oxygen than those deposited by DC ECD. The films had band gap energies in a range from 1.5 eV and 2.1 eV. By a photoelectrochemical measurement, it was confirmed that CZTSO films showed p-type conduction and photosensitivity. CZTSO/ZnO heterojunctions exhibited rectification properties in a current-voltage measurement. |
| format | Article |
| id | doaj-art-93df5f398efd4b2a8d3298a2f3c4bae6 |
| institution | Kabale University |
| issn | 1110-662X 1687-529X |
| language | English |
| publishDate | 2012-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Photoenergy |
| spelling | doaj-art-93df5f398efd4b2a8d3298a2f3c4bae62025-02-03T06:48:16ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2012-01-01201210.1155/2012/154704154704Fabrication of Cu–Zn–Sn–S–O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction CellsKai Yang0Masaya Ichimura1Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Gokiso, Showa, Nagoya 466-8555, JapanDepartment of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Gokiso, Showa, Nagoya 466-8555, JapanA new multinary semiconductor Cu2ZnSnS4−𝑥O𝑥 (CZTSO), which does not contain toxic elements and expensive rare metals, was fabricated by the electrochemical deposition (ECD) method. CZTSO thin films were deposited onto indium tin oxide (ITO-) coated glass substrates by DC and two-step pulsed ECD from aqueous solutions containing CuSO4, ZnSO4, SnSO4, and Na2S2O3. The films deposited by pulsed ECD contained smaller amount of oxygen than those deposited by DC ECD. The films had band gap energies in a range from 1.5 eV and 2.1 eV. By a photoelectrochemical measurement, it was confirmed that CZTSO films showed p-type conduction and photosensitivity. CZTSO/ZnO heterojunctions exhibited rectification properties in a current-voltage measurement.http://dx.doi.org/10.1155/2012/154704 |
| spellingShingle | Kai Yang Masaya Ichimura Fabrication of Cu–Zn–Sn–S–O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells International Journal of Photoenergy |
| title | Fabrication of Cu–Zn–Sn–S–O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells |
| title_full | Fabrication of Cu–Zn–Sn–S–O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells |
| title_fullStr | Fabrication of Cu–Zn–Sn–S–O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells |
| title_full_unstemmed | Fabrication of Cu–Zn–Sn–S–O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells |
| title_short | Fabrication of Cu–Zn–Sn–S–O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells |
| title_sort | fabrication of cu zn sn s o thin films by the electrochemical deposition method and application to heterojunction cells |
| url | http://dx.doi.org/10.1155/2012/154704 |
| work_keys_str_mv | AT kaiyang fabricationofcuznsnsothinfilmsbytheelectrochemicaldepositionmethodandapplicationtoheterojunctioncells AT masayaichimura fabricationofcuznsnsothinfilmsbytheelectrochemicaldepositionmethodandapplicationtoheterojunctioncells |