ALD-Deposited Hydroxyl-Rich NiO<sub>x</sub> to Enhance SAM Anchoring for Stable and Efficient Perovskite Solar Cells
The interface between nickel oxide (NiO<sub>x</sub>) and self-assembled monolayers (SAMs) in perovskite solar cells (PSCs) often suffers from limited adsorption strength, poor energy-level alignment, and inadequate defect passivation, which hinder device performance and stability. To add...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-03-01
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| Series: | Molecules |
| Subjects: | |
| Online Access: | https://www.mdpi.com/1420-3049/30/6/1299 |
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| Summary: | The interface between nickel oxide (NiO<sub>x</sub>) and self-assembled monolayers (SAMs) in perovskite solar cells (PSCs) often suffers from limited adsorption strength, poor energy-level alignment, and inadequate defect passivation, which hinder device performance and stability. To address these issues, we introduce a hybrid hole selective layer (HSL) combining atomic layer deposition (ALD)-fabricated NiO<sub>x</sub> with full-aromatic SAM molecules, creating a highly stable and efficient interface. ALD NiO<sub>x</sub>, enriched with hydroxyl groups, provides robust adsorption sites for the SAM molecule MeO-PhPACz, ensuring a strong, stable interaction. This hybrid HSL enhances energy-level alignment, hole selectivity, and defect passivation at the NiO<sub>x</sub>/perovskite interface. Devices utilizing this approach demonstrate significant performance improvements, achieving a power conversion efficiency (PCE) of 21.74%, with reduced voltage losses and minimal hysteresis. Furthermore, operational stability tests reveal enhanced durability under elevated humidity and temperature conditions. These findings highlight the potential of ALD NiO<sub>x</sub> and SAM hybrid HSL to overcome existing barriers, advancing the commercial viability of PSC technologies. |
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| ISSN: | 1420-3049 |