RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells

RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type.

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Bibliographic Details
Main Authors: V.S. Zakhvalinskii, E.A. Piljuk, I.Yu. Goncharov, V.G. Rodriges, A.P. Kuzmenko, S.V. Taran, P.A. Abakumov
Format: Article
Language:English
Published: Sumy State University 2014-07-01
Series:Журнал нано- та електронної фізики
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Online Access:http://jnep.sumdu.edu.ua/download/numbers/2014/3/articles/jnep_2014_V6_03062.pdf
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