RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells
RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type.
Saved in:
| Main Authors: | V.S. Zakhvalinskii, E.A. Piljuk, I.Yu. Goncharov, V.G. Rodriges, A.P. Kuzmenko, S.V. Taran, P.A. Abakumov |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Sumy State University
2014-07-01
|
| Series: | Журнал нано- та електронної фізики |
| Subjects: | |
| Online Access: | http://jnep.sumdu.edu.ua/download/numbers/2014/3/articles/jnep_2014_V6_03062.pdf |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Formation of Silicon Carbide Films by Magnetron Sputtering of Compound Carbon-silicon Target
by: V.I. Perekrestov, et al.
Published: (2015-06-01) -
The Silicon-To-Silicon Anodic Bonding Using Sputter Deposited Intermediate Glass Layer
by: R. Tiwari, et al.
Published: (2011-01-01) -
SYSTEM OF STABILIZATION OF REACTIVE MAGNETRON SPUTTERING PROCESS
by: A. P. Burmakou, et al.
Published: (2018-06-01) -
Initiation of Polarized State in the Tantalum Oxide Thin Films Grown by Magnetron Sputtering on a Substrate of Monocrystalline Silicon (100) Followed by Argon and Oxygen Ions
by: I.Yu. Goncharov, et al.
Published: (2015-12-01) -
Titanium Carbide Obtained by Magnetron Sputtering of Graphite on Heated Titanium Substrate
by: O.E.В Kaipoldayev, et al.
Published: (2017-10-01)