Macroporous layers formation on n-Si substrates in an HF-containing electrolyte adding HCl

Macroporous layers formation on n-Si substrates in an HF-containing electrolyte adding HCl

Adding an oxidizing agent to a solution of hydrofluoric acid significantly changes the process of electrochemical etching, because allows to accelerate the dissolution of electron silicon. In this work, we studied the formation process and morphology of macropores in high-resistance n-Si dependi...

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Bibliographic Details
Main Authors: V. V. Bolotov, K. E. Ivlev, I. V. Ponomareva
Format: Article
Language:English
Published: Omsk State Technical University, Federal State Autonoumos Educational Institution of Higher Education 2020-06-01
Series:Омский научный вестник
Subjects:
porous silicon
electrochemical etching
electron microscopy
Online Access:https://www.omgtu.ru/general_information/media_omgtu/journal_of_omsk_research_journal/files/arhiv/2020/3%20(171)/65-69%20%D0%91%D0%BE%D0%BB%D0%BE%D1%82%D0%BE%D0%B2%20%D0%92.%20%D0%92.,%20%D0%98%D0%B2%D0%BB%D0%B5%D0%B2%20%D0%9A.%20%D0%95.,%20%D0%9F%D0%BE%D0%BD%D0%BE%D0%BC%D0%B0%D1%80%D0%B5%D0%B2%D0%B0%20%D0%98.%20%D0%92..pdf
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