Lin, C., & Chiu, H. GaN-Based High-k Praseodymium Oxide Gate MISFETs with P2S5/(NH4)2SX + UV Interface Treatment Technology. Wiley.
Chicago Style (17th ed.) CitationLin, Chao-Wei, and Hsien-Chin Chiu. GaN-Based High-k Praseodymium Oxide Gate MISFETs with P2S5/(NH4)2SX + UV Interface Treatment Technology. Wiley.
MLA (9th ed.) CitationLin, Chao-Wei, and Hsien-Chin Chiu. GaN-Based High-k Praseodymium Oxide Gate MISFETs with P2S5/(NH4)2SX + UV Interface Treatment Technology. Wiley.
Warning: These citations may not always be 100% accurate.