Xu, L., Park, K., Lei, H., Liu, P., Kim, E., Cho, Y., . . . Chen, C. Chemically-induced active micro-nano bubbles assisting chemical mechanical polishing: Modeling and experiments. Tsinghua University Press.
Chicago Style (17th ed.) CitationXu, Lei, Kihong Park, Hong Lei, Pengzhan Liu, Eungchul Kim, Yeongkwang Cho, Taesung Kim, and Chuandong Chen. Chemically-induced Active Micro-nano Bubbles Assisting Chemical Mechanical Polishing: Modeling and Experiments. Tsinghua University Press.
MLA (9th ed.) CitationXu, Lei, et al. Chemically-induced Active Micro-nano Bubbles Assisting Chemical Mechanical Polishing: Modeling and Experiments. Tsinghua University Press.
Warning: These citations may not always be 100% accurate.