Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction
Abstract Two novel ruthenium complexes belonging to the Ru(II)(DAD)(Cym) (DAD = diazadienyl) (Cym = cymene) compound family are introduced as promising precursors. Their chemical nature, potential for chemical vapor deposition (CVD), and possibly atomic layer deposition (ALD) are demonstrated. The d...
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| Main Authors: | , , , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2022-12-01
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| Series: | Advanced Materials Interfaces |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/admi.202201709 |
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