Effects of the Interface Properties on the Performance of UV-C Photoresistors: Gallium Oxide as Case Study

Electrical contacts are of the greatest importance as they decisively contribute to the overall performance of photoresistors. Undoped κ-Ga<sub>2</sub>O<sub>3</sub> is an ideal material for photoresistors with high performance in the UV-C spectral region thanks to its intrins...

Full description

Saved in:
Bibliographic Details
Main Authors: Maura Pavesi, Antonella Parisini, Pietro Calvi, Alessio Bosio, Roberto Fornari
Format: Article
Language:English
Published: MDPI AG 2025-01-01
Series:Sensors
Subjects:
Online Access:https://www.mdpi.com/1424-8220/25/2/345
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1832587578122960896
author Maura Pavesi
Antonella Parisini
Pietro Calvi
Alessio Bosio
Roberto Fornari
author_facet Maura Pavesi
Antonella Parisini
Pietro Calvi
Alessio Bosio
Roberto Fornari
author_sort Maura Pavesi
collection DOAJ
description Electrical contacts are of the greatest importance as they decisively contribute to the overall performance of photoresistors. Undoped κ-Ga<sub>2</sub>O<sub>3</sub> is an ideal material for photoresistors with high performance in the UV-C spectral region thanks to its intrinsic solar blindness and extremely low dark current. The quality assessment of the contact/κ-Ga<sub>2</sub>O<sub>3</sub> interface is therefore of paramount importance. The transfer length method is not applicable to undoped Ga<sub>2</sub>O<sub>3</sub> because the interface with several metals shows a non-ohmic character, and a non-equivalent contact resistance could restrict its applicability. In this work, a new methodological procedure to evaluate the quality of contact interface and its effect on the sensing performance of UV-C photoresistors is presented, using the SnO<sub>2−x</sub>/κ-Ga<sub>2</sub>O<sub>3</sub> contact interface as a case study. The proposed method includes a critical comparison between two-point and four-point probe measurements, over a wide range of voltages. The investigation showed that the effect of contact resistance is more pronounced at low voltages. The presented method can be easily extended to any kind of metal/semiconductor or degenerate-semiconductor/semiconductor interface.
format Article
id doaj-art-7bac82a1adbe4382980c6fcba7618def
institution Kabale University
issn 1424-8220
language English
publishDate 2025-01-01
publisher MDPI AG
record_format Article
series Sensors
spelling doaj-art-7bac82a1adbe4382980c6fcba7618def2025-01-24T13:48:35ZengMDPI AGSensors1424-82202025-01-0125234510.3390/s25020345Effects of the Interface Properties on the Performance of UV-C Photoresistors: Gallium Oxide as Case StudyMaura Pavesi0Antonella Parisini1Pietro Calvi2Alessio Bosio3Roberto Fornari4Department of Mathematical, Physical and Computer Sciences, University of Parma, Viale delle Scienze 7/A, 43124 Parma, ItalyDepartment of Mathematical, Physical and Computer Sciences, University of Parma, Viale delle Scienze 7/A, 43124 Parma, ItalyDepartment of Mathematical, Physical and Computer Sciences, University of Parma, Viale delle Scienze 7/A, 43124 Parma, ItalyDepartment of Mathematical, Physical and Computer Sciences, University of Parma, Viale delle Scienze 7/A, 43124 Parma, ItalyDepartment of Mathematical, Physical and Computer Sciences, University of Parma, Viale delle Scienze 7/A, 43124 Parma, ItalyElectrical contacts are of the greatest importance as they decisively contribute to the overall performance of photoresistors. Undoped κ-Ga<sub>2</sub>O<sub>3</sub> is an ideal material for photoresistors with high performance in the UV-C spectral region thanks to its intrinsic solar blindness and extremely low dark current. The quality assessment of the contact/κ-Ga<sub>2</sub>O<sub>3</sub> interface is therefore of paramount importance. The transfer length method is not applicable to undoped Ga<sub>2</sub>O<sub>3</sub> because the interface with several metals shows a non-ohmic character, and a non-equivalent contact resistance could restrict its applicability. In this work, a new methodological procedure to evaluate the quality of contact interface and its effect on the sensing performance of UV-C photoresistors is presented, using the SnO<sub>2−x</sub>/κ-Ga<sub>2</sub>O<sub>3</sub> contact interface as a case study. The proposed method includes a critical comparison between two-point and four-point probe measurements, over a wide range of voltages. The investigation showed that the effect of contact resistance is more pronounced at low voltages. The presented method can be easily extended to any kind of metal/semiconductor or degenerate-semiconductor/semiconductor interface.https://www.mdpi.com/1424-8220/25/2/345SnO<sub>2−x</sub>/κ-Ga<sub>2</sub>O<sub>3</sub> interfacecontact resistanceTLMfour-point probe configurationUV-C detectorsphotogain
spellingShingle Maura Pavesi
Antonella Parisini
Pietro Calvi
Alessio Bosio
Roberto Fornari
Effects of the Interface Properties on the Performance of UV-C Photoresistors: Gallium Oxide as Case Study
Sensors
SnO<sub>2−x</sub>/κ-Ga<sub>2</sub>O<sub>3</sub> interface
contact resistance
TLM
four-point probe configuration
UV-C detectors
photogain
title Effects of the Interface Properties on the Performance of UV-C Photoresistors: Gallium Oxide as Case Study
title_full Effects of the Interface Properties on the Performance of UV-C Photoresistors: Gallium Oxide as Case Study
title_fullStr Effects of the Interface Properties on the Performance of UV-C Photoresistors: Gallium Oxide as Case Study
title_full_unstemmed Effects of the Interface Properties on the Performance of UV-C Photoresistors: Gallium Oxide as Case Study
title_short Effects of the Interface Properties on the Performance of UV-C Photoresistors: Gallium Oxide as Case Study
title_sort effects of the interface properties on the performance of uv c photoresistors gallium oxide as case study
topic SnO<sub>2−x</sub>/κ-Ga<sub>2</sub>O<sub>3</sub> interface
contact resistance
TLM
four-point probe configuration
UV-C detectors
photogain
url https://www.mdpi.com/1424-8220/25/2/345
work_keys_str_mv AT maurapavesi effectsoftheinterfacepropertiesontheperformanceofuvcphotoresistorsgalliumoxideascasestudy
AT antonellaparisini effectsoftheinterfacepropertiesontheperformanceofuvcphotoresistorsgalliumoxideascasestudy
AT pietrocalvi effectsoftheinterfacepropertiesontheperformanceofuvcphotoresistorsgalliumoxideascasestudy
AT alessiobosio effectsoftheinterfacepropertiesontheperformanceofuvcphotoresistorsgalliumoxideascasestudy
AT robertofornari effectsoftheinterfacepropertiesontheperformanceofuvcphotoresistorsgalliumoxideascasestudy