Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films
Cu thin films were deposited on Si substrates using direct current (DC) magnetron sputtering. Microstructure evolution and mechanical properties of Cu thin films with different annealing temperatures were investigated by atomic force microscopy (AFM), X-ray diffraction (XRD), and nanoindentation. Th...
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Wiley
2015-01-01
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| Series: | Advances in Materials Science and Engineering |
| Online Access: | http://dx.doi.org/10.1155/2015/969580 |
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| author | Shiwen Du Yongtang Li |
| author_facet | Shiwen Du Yongtang Li |
| author_sort | Shiwen Du |
| collection | DOAJ |
| description | Cu thin films were deposited on Si substrates using direct current (DC) magnetron sputtering. Microstructure evolution and mechanical properties of Cu thin films with different annealing temperatures were investigated by atomic force microscopy (AFM), X-ray diffraction (XRD), and nanoindentation. The surface morphology, roughness, and grain size of the Cu films were characterized by AFM. The minimization of energy including surface energy, interface energy, and strain energy (elastic strain energy and plastic strain energy) controlled the microstructural evolution. A classical Hall-Petch relationship was exhibited between the yield stress and grain size. The residual stress depended on crystal orientation. The residual stress as-deposited was of tension and decreased with decreasing of (111) orientation. The ratio of texture coefficient of (111)/(220) can be used as a merit for the state of residual stress. |
| format | Article |
| id | doaj-art-763b854c3d40416597ecd4d3dbdf6bd7 |
| institution | Kabale University |
| issn | 1687-8434 1687-8442 |
| language | English |
| publishDate | 2015-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Advances in Materials Science and Engineering |
| spelling | doaj-art-763b854c3d40416597ecd4d3dbdf6bd72025-02-03T01:24:21ZengWileyAdvances in Materials Science and Engineering1687-84341687-84422015-01-01201510.1155/2015/969580969580Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin FilmsShiwen Du0Yongtang Li1School of Materials Science and Engineering, Shanxi Key Laboratory of Metallic Materials Forming Theory and Technology, Taiyuan University of Science and Technology, Taiyuan 030024, ChinaSchool of Materials Science and Engineering, Shanxi Key Laboratory of Metallic Materials Forming Theory and Technology, Taiyuan University of Science and Technology, Taiyuan 030024, ChinaCu thin films were deposited on Si substrates using direct current (DC) magnetron sputtering. Microstructure evolution and mechanical properties of Cu thin films with different annealing temperatures were investigated by atomic force microscopy (AFM), X-ray diffraction (XRD), and nanoindentation. The surface morphology, roughness, and grain size of the Cu films were characterized by AFM. The minimization of energy including surface energy, interface energy, and strain energy (elastic strain energy and plastic strain energy) controlled the microstructural evolution. A classical Hall-Petch relationship was exhibited between the yield stress and grain size. The residual stress depended on crystal orientation. The residual stress as-deposited was of tension and decreased with decreasing of (111) orientation. The ratio of texture coefficient of (111)/(220) can be used as a merit for the state of residual stress.http://dx.doi.org/10.1155/2015/969580 |
| spellingShingle | Shiwen Du Yongtang Li Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films Advances in Materials Science and Engineering |
| title | Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films |
| title_full | Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films |
| title_fullStr | Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films |
| title_full_unstemmed | Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films |
| title_short | Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films |
| title_sort | effect of annealing on microstructure and mechanical properties of magnetron sputtered cu thin films |
| url | http://dx.doi.org/10.1155/2015/969580 |
| work_keys_str_mv | AT shiwendu effectofannealingonmicrostructureandmechanicalpropertiesofmagnetronsputteredcuthinfilms AT yongtangli effectofannealingonmicrostructureandmechanicalpropertiesofmagnetronsputteredcuthinfilms |