Study on the Influence of Local High Steps on the Uniformity of Global Critical Dimension in Implant Layers
In the processes of integrated circuits fabrication, the distribution of high steps in implant layers is one of the critical factors that affects the uniformity and quality of implant-layer photoresist critical dimension(CD). Based on the study of the distribution, density, width and the distance fr...
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| Main Author: | |
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| Format: | Article |
| Language: | English |
| Published: |
Editorial Department of Journal of Nantong University (Natural Science Edition)
2020-12-01
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| Series: | Nantong Daxue xuebao. Ziran kexue ban |
| Subjects: | |
| Online Access: | https://ngzke.cbpt.cnki.net/portal/journal/portal/client/paper/79e8b677fcd41fa72122d50cefb8aa4a |
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