Removal of trace ammonia by ionic liquids
Ammonia (NH3), a critical process gas in semiconductor production, is the second largest air pollution from semiconductor factories as well as one of PM2.5 precursors. NH3 emission standard will be regulated more strictly from current 2.5 ppm to 0.8 ppm as revealed by the 2025 semiconductor air poll...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2025-01-01
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| Series: | E3S Web of Conferences |
| Online Access: | https://www.e3s-conferences.org/articles/e3sconf/pdf/2025/20/e3sconf_icepp2024_02002.pdf |
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| Summary: | Ammonia (NH3), a critical process gas in semiconductor production, is the second largest air pollution from semiconductor factories as well as one of PM2.5 precursors. NH3 emission standard will be regulated more strictly from current 2.5 ppm to 0.8 ppm as revealed by the 2025 semiconductor air pollution standard draft. NH3 emission concentration was controlled using wet scrubber to achieve the regulations by adjusting pH value and increasing the water-recycling rate. However, it resulted in increased water consumption and the NH3 exhaust concentration still above emission standards (1 ppm). The purpose of this project was to develop ionic liquids which have high absorption ability to remove low NH3 concentration. The results show that IL-1 and IL-5 were both good for NH3 absorption, which the absorption capacity was greater than water. Among them, the liquid level of IL-1 will increase after the NH3 absorption test, which indicates that it has good water absorption capacity. It has the dual functions of dehumidification and ammonia removal. Furthermore, IL-5 has the best NH3 absorption ability which compared at same concentration can maintain the NH3 outlet concentration at 0 ppm for more than 351 minutes. |
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| ISSN: | 2267-1242 |