Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma
A capacitively coupled radio-frequency argon plasma, used for tungsten sputtering deposition, is characterized using Langmuir probe measurements. Druyvesteyn’s method is used to evaluate plasma parameters through the integral of the Electron Energy Distribution Function (EEDF). In the pressure range...
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| Format: | Article |
| Language: | English |
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MDPI AG
2025-02-01
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| Series: | Plasma |
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| Online Access: | https://www.mdpi.com/2571-6182/8/1/8 |
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| author | Espedito Vassallo Miriam Saleh Matteo Pedroni Anna Cremona Dario Ripamonti |
| author_facet | Espedito Vassallo Miriam Saleh Matteo Pedroni Anna Cremona Dario Ripamonti |
| author_sort | Espedito Vassallo |
| collection | DOAJ |
| description | A capacitively coupled radio-frequency argon plasma, used for tungsten sputtering deposition, is characterized using Langmuir probe measurements. Druyvesteyn’s method is used to evaluate plasma parameters through the integral of the Electron Energy Distribution Function (EEDF). In the pressure range analyzed (0.6–10 Pa), the obtained distributions are not Maxwellian, which suggests some depletion of electrons with higher energies. The obtained plasma parameters are compared with those derived from the graphical method. The electron temperature obtained via the graphical method is always lower than the effective temperatures derived from EEDFs, and vice versa, the electron density is overestimated by the graphical method. Optical Emission Spectroscopy is used to monitor the atoms sputtered in the plasma process. The behavior of excited species correlates with the plasma parameters. |
| format | Article |
| id | doaj-art-68f001fdfd1442fa8e503d4d1ec8e581 |
| institution | DOAJ |
| issn | 2571-6182 |
| language | English |
| publishDate | 2025-02-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Plasma |
| spelling | doaj-art-68f001fdfd1442fa8e503d4d1ec8e5812025-08-20T02:42:29ZengMDPI AGPlasma2571-61822025-02-0181810.3390/plasma8010008Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon PlasmaEspedito Vassallo0Miriam Saleh1Matteo Pedroni2Anna Cremona3Dario Ripamonti4Institute for Plasma Science and Technology (ISTP), National Research Council (CNR), Via R. Cozzi 53, 20125 Milan, ItalyInstitute for Plasma Science and Technology (ISTP), National Research Council (CNR), Via R. Cozzi 53, 20125 Milan, ItalyInstitute for Plasma Science and Technology (ISTP), National Research Council (CNR), Via R. Cozzi 53, 20125 Milan, ItalyInstitute for Plasma Science and Technology (ISTP), National Research Council (CNR), Via R. Cozzi 53, 20125 Milan, ItalyInstitute of Condensed Matter Chemistry and Technologies for Energy (ICMATE), National Research Council (CNR), Via R. Cozzi 53, 20125 Milan, ItalyA capacitively coupled radio-frequency argon plasma, used for tungsten sputtering deposition, is characterized using Langmuir probe measurements. Druyvesteyn’s method is used to evaluate plasma parameters through the integral of the Electron Energy Distribution Function (EEDF). In the pressure range analyzed (0.6–10 Pa), the obtained distributions are not Maxwellian, which suggests some depletion of electrons with higher energies. The obtained plasma parameters are compared with those derived from the graphical method. The electron temperature obtained via the graphical method is always lower than the effective temperatures derived from EEDFs, and vice versa, the electron density is overestimated by the graphical method. Optical Emission Spectroscopy is used to monitor the atoms sputtered in the plasma process. The behavior of excited species correlates with the plasma parameters.https://www.mdpi.com/2571-6182/8/1/8plasma sputteringLangmuir probecapacitively coupled argon plasma |
| spellingShingle | Espedito Vassallo Miriam Saleh Matteo Pedroni Anna Cremona Dario Ripamonti Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma Plasma plasma sputtering Langmuir probe capacitively coupled argon plasma |
| title | Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma |
| title_full | Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma |
| title_fullStr | Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma |
| title_full_unstemmed | Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma |
| title_short | Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma |
| title_sort | characterization of tungsten sputtering processes in a capacitively coupled argon plasma |
| topic | plasma sputtering Langmuir probe capacitively coupled argon plasma |
| url | https://www.mdpi.com/2571-6182/8/1/8 |
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