Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells
Mo films prepared under a single deposition condition seldom simultaneously obtain a low resistivity and a good adhesion necessary for use in solar cells. In order to surmount the obstacle, bilayer Mo films using DC sputtering at a higher working pressure and a lower working pressure have been attem...
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| Format: | Article |
| Language: | English |
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Wiley
2014-01-01
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| Series: | Advances in Materials Science and Engineering |
| Online Access: | http://dx.doi.org/10.1155/2014/531401 |
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| author | Sea-Fue Wang Hsiao-Ching Yang Chien-Fong Liu Huy-Yun Y. Bor |
| author_facet | Sea-Fue Wang Hsiao-Ching Yang Chien-Fong Liu Huy-Yun Y. Bor |
| author_sort | Sea-Fue Wang |
| collection | DOAJ |
| description | Mo films prepared under a single deposition condition seldom simultaneously obtain a low resistivity and a good adhesion necessary for use in solar cells. In order to surmount the obstacle, bilayer Mo films using DC sputtering at a higher working pressure and a lower working pressure have been attempted as reported in the literature. In this study, RF sputtering with different powers in conjunction with different working pressures was explored to prepare bilayer Mo film. The first bottom layer was grown at a RF sputtering power of 30 W and a working pressure of 12 mTorr, and the second top layer was deposited at 100 W and 4.5 mTorr. The films revealed a columnar growth with a preferred orientation along the (110) plane. The bilayer Mo films reported an electrical resistivity of 6.35 × 10−5 Ω-cm and passed the Scotch tape test for adhesion to the soda-lime glass substrate, thereby qualifying the bilayer Mo films for use as back metal contacts for CIGS substrates. |
| format | Article |
| id | doaj-art-653f376e255a4caeb6f374389045bda8 |
| institution | Kabale University |
| issn | 1687-8434 1687-8442 |
| language | English |
| publishDate | 2014-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Advances in Materials Science and Engineering |
| spelling | doaj-art-653f376e255a4caeb6f374389045bda82025-02-03T06:10:48ZengWileyAdvances in Materials Science and Engineering1687-84341687-84422014-01-01201410.1155/2014/531401531401Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar CellsSea-Fue Wang0Hsiao-Ching Yang1Chien-Fong Liu2Huy-Yun Y. Bor3Department of Materials and Minerals Resources Engineering, National Taipei University of Technology, 1, Section 3, Chung-Hsiao E. Road, Taipei 106, TaiwanDepartment of Materials and Minerals Resources Engineering, National Taipei University of Technology, 1, Section 3, Chung-Hsiao E. Road, Taipei 106, TaiwanDepartment of Materials and Minerals Resources Engineering, National Taipei University of Technology, 1, Section 3, Chung-Hsiao E. Road, Taipei 106, TaiwanMaterials & Electro-Optics Research Division, Chung-Shan Institute of Science & Technology, 481, Jia’an Sec., Zhongzheng Rd., Longtan Township, Taoyuan County 325, TaiwanMo films prepared under a single deposition condition seldom simultaneously obtain a low resistivity and a good adhesion necessary for use in solar cells. In order to surmount the obstacle, bilayer Mo films using DC sputtering at a higher working pressure and a lower working pressure have been attempted as reported in the literature. In this study, RF sputtering with different powers in conjunction with different working pressures was explored to prepare bilayer Mo film. The first bottom layer was grown at a RF sputtering power of 30 W and a working pressure of 12 mTorr, and the second top layer was deposited at 100 W and 4.5 mTorr. The films revealed a columnar growth with a preferred orientation along the (110) plane. The bilayer Mo films reported an electrical resistivity of 6.35 × 10−5 Ω-cm and passed the Scotch tape test for adhesion to the soda-lime glass substrate, thereby qualifying the bilayer Mo films for use as back metal contacts for CIGS substrates.http://dx.doi.org/10.1155/2014/531401 |
| spellingShingle | Sea-Fue Wang Hsiao-Ching Yang Chien-Fong Liu Huy-Yun Y. Bor Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells Advances in Materials Science and Engineering |
| title | Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells |
| title_full | Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells |
| title_fullStr | Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells |
| title_full_unstemmed | Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells |
| title_short | Characteristics of Bilayer Molybdenum Films Deposited Using RF Sputtering for Back Contact of Thin Film Solar Cells |
| title_sort | characteristics of bilayer molybdenum films deposited using rf sputtering for back contact of thin film solar cells |
| url | http://dx.doi.org/10.1155/2014/531401 |
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