Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct
Abstract In this work, a new ALD process for palladium metal thin films using dichlorobis(triethylphosphine)palladium(II) (PdCl2(PEt3)2) and 1,4‐bis(trimethylsilyl)‐1,4‐dihydropyrazine ((Me3Si)2DHP) as reactants, is developed. The metal precursor is chosen based on the known reactivity of metal hali...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2025-02-01
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| Series: | Advanced Materials Interfaces |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/admi.202400579 |
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