Annealing Study on Praseodymium-Doped Indium Zinc Oxide Thin-Film Transistors and Fabrication of Flexible Devices

The praseodymium-doped indium zinc oxide (PrIZO) thin-film transistor (TFT) is promising for applications in flat-panel displays, due to its high carrier mobility and stability. Nevertheless, there are few studies on the mechanism of annealing on PrIZO films and the fabrication of flexible devices....

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Main Authors: Zhenyu Wu, Honglong Ning, Han Li, Xiaoqin Wei, Dongxiang Luo, Dong Yuan, Zhihao Liang, Guoping Su, Rihui Yao, Junbiao Peng
Format: Article
Language:English
Published: MDPI AG 2024-12-01
Series:Micromachines
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Online Access:https://www.mdpi.com/2072-666X/16/1/17
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_version_ 1832587918589296640
author Zhenyu Wu
Honglong Ning
Han Li
Xiaoqin Wei
Dongxiang Luo
Dong Yuan
Zhihao Liang
Guoping Su
Rihui Yao
Junbiao Peng
author_facet Zhenyu Wu
Honglong Ning
Han Li
Xiaoqin Wei
Dongxiang Luo
Dong Yuan
Zhihao Liang
Guoping Su
Rihui Yao
Junbiao Peng
author_sort Zhenyu Wu
collection DOAJ
description The praseodymium-doped indium zinc oxide (PrIZO) thin-film transistor (TFT) is promising for applications in flat-panel displays, due to its high carrier mobility and stability. Nevertheless, there are few studies on the mechanism of annealing on PrIZO films and the fabrication of flexible devices. In this work, we first optimized the annealing-process parameters on the glass substrate. As the annealing temperature rises, the film tends to be denser and obtains a lower surface roughness, a narrower optical-band gap and less oxygen-vacancy content. However, the μ-PCD test shows the 250 °C-annealed film obtains the least defects. And the PrIZO TFT annealed at 250 °C exhibited a desired performance with a saturation mobility (μ<sub>sat</sub>) of 14.26 cm<sup>2</sup>·V<sup>−1</sup>·s<sup>−1</sup>, a subthreshold swing (SS) of 0.14 V·dec<sup>−1</sup>, an interface trap density (D<sub>it</sub>) of 3.17 × 10<sup>11</sup>, an I<sub>on</sub>/I<sub>off</sub> ratio of 1.83 × 10<sup>8</sup> and a threshold voltage (Vth) of −1.15 V. The flexible devices were prepared using the optimized parameters on the Polyimide (PI) substrate and subjected to static bending tests. After bending at a radius of 5 mm, the mobility of devices decreases slightly from 12.48 to 10.87 cm<sup>2</sup>·V<sup>−1</sup>·s<sup>−1</sup>, demonstrating the great potential of PrIZO for flexible displays.
format Article
id doaj-art-58319f8fc2174ea7adb0f63a5db631b7
institution Kabale University
issn 2072-666X
language English
publishDate 2024-12-01
publisher MDPI AG
record_format Article
series Micromachines
spelling doaj-art-58319f8fc2174ea7adb0f63a5db631b72025-01-24T13:41:51ZengMDPI AGMicromachines2072-666X2024-12-011611710.3390/mi16010017Annealing Study on Praseodymium-Doped Indium Zinc Oxide Thin-Film Transistors and Fabrication of Flexible DevicesZhenyu Wu0Honglong Ning1Han Li2Xiaoqin Wei3Dongxiang Luo4Dong Yuan5Zhihao Liang6Guoping Su7Rihui Yao8Junbiao Peng9Guangdong Basic Research Center of Excellence for Energy & Information Polymer Materials, State Key Laboratory of Luminescent Materials and Devices, School of Materials Sciences and Engineering, South China University of Technology, Guangzhou 510640, ChinaGuangdong Basic Research Center of Excellence for Energy & Information Polymer Materials, State Key Laboratory of Luminescent Materials and Devices, School of Materials Sciences and Engineering, South China University of Technology, Guangzhou 510640, ChinaSouthwest Institute of Technology and Engineering, Chongqing 400039, ChinaSouthwest Institute of Technology and Engineering, Chongqing 400039, ChinaHuangpu Hydrogen Innovation Center/Guangzhou Key Laboratory for Clean Energy and Materials, School of Chemistry and Chemical Engineering, Guangzhou University, Guangzhou 510006, ChinaGuangdong Provincial Key Laboratory of Optical Information Materials and Technology, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, ChinaGuangdong Basic Research Center of Excellence for Energy & Information Polymer Materials, State Key Laboratory of Luminescent Materials and Devices, School of Materials Sciences and Engineering, South China University of Technology, Guangzhou 510640, ChinaGuangdong Basic Research Center of Excellence for Energy & Information Polymer Materials, State Key Laboratory of Luminescent Materials and Devices, School of Materials Sciences and Engineering, South China University of Technology, Guangzhou 510640, ChinaGuangdong Basic Research Center of Excellence for Energy & Information Polymer Materials, State Key Laboratory of Luminescent Materials and Devices, School of Materials Sciences and Engineering, South China University of Technology, Guangzhou 510640, ChinaGuangdong Basic Research Center of Excellence for Energy & Information Polymer Materials, State Key Laboratory of Luminescent Materials and Devices, School of Materials Sciences and Engineering, South China University of Technology, Guangzhou 510640, ChinaThe praseodymium-doped indium zinc oxide (PrIZO) thin-film transistor (TFT) is promising for applications in flat-panel displays, due to its high carrier mobility and stability. Nevertheless, there are few studies on the mechanism of annealing on PrIZO films and the fabrication of flexible devices. In this work, we first optimized the annealing-process parameters on the glass substrate. As the annealing temperature rises, the film tends to be denser and obtains a lower surface roughness, a narrower optical-band gap and less oxygen-vacancy content. However, the μ-PCD test shows the 250 °C-annealed film obtains the least defects. And the PrIZO TFT annealed at 250 °C exhibited a desired performance with a saturation mobility (μ<sub>sat</sub>) of 14.26 cm<sup>2</sup>·V<sup>−1</sup>·s<sup>−1</sup>, a subthreshold swing (SS) of 0.14 V·dec<sup>−1</sup>, an interface trap density (D<sub>it</sub>) of 3.17 × 10<sup>11</sup>, an I<sub>on</sub>/I<sub>off</sub> ratio of 1.83 × 10<sup>8</sup> and a threshold voltage (Vth) of −1.15 V. The flexible devices were prepared using the optimized parameters on the Polyimide (PI) substrate and subjected to static bending tests. After bending at a radius of 5 mm, the mobility of devices decreases slightly from 12.48 to 10.87 cm<sup>2</sup>·V<sup>−1</sup>·s<sup>−1</sup>, demonstrating the great potential of PrIZO for flexible displays.https://www.mdpi.com/2072-666X/16/1/17praseodymium-dopedindium zinc oxideannealing temperatureflexiblethin-film transistor
spellingShingle Zhenyu Wu
Honglong Ning
Han Li
Xiaoqin Wei
Dongxiang Luo
Dong Yuan
Zhihao Liang
Guoping Su
Rihui Yao
Junbiao Peng
Annealing Study on Praseodymium-Doped Indium Zinc Oxide Thin-Film Transistors and Fabrication of Flexible Devices
Micromachines
praseodymium-doped
indium zinc oxide
annealing temperature
flexible
thin-film transistor
title Annealing Study on Praseodymium-Doped Indium Zinc Oxide Thin-Film Transistors and Fabrication of Flexible Devices
title_full Annealing Study on Praseodymium-Doped Indium Zinc Oxide Thin-Film Transistors and Fabrication of Flexible Devices
title_fullStr Annealing Study on Praseodymium-Doped Indium Zinc Oxide Thin-Film Transistors and Fabrication of Flexible Devices
title_full_unstemmed Annealing Study on Praseodymium-Doped Indium Zinc Oxide Thin-Film Transistors and Fabrication of Flexible Devices
title_short Annealing Study on Praseodymium-Doped Indium Zinc Oxide Thin-Film Transistors and Fabrication of Flexible Devices
title_sort annealing study on praseodymium doped indium zinc oxide thin film transistors and fabrication of flexible devices
topic praseodymium-doped
indium zinc oxide
annealing temperature
flexible
thin-film transistor
url https://www.mdpi.com/2072-666X/16/1/17
work_keys_str_mv AT zhenyuwu annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices
AT honglongning annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices
AT hanli annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices
AT xiaoqinwei annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices
AT dongxiangluo annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices
AT dongyuan annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices
AT zhihaoliang annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices
AT guopingsu annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices
AT rihuiyao annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices
AT junbiaopeng annealingstudyonpraseodymiumdopedindiumzincoxidethinfilmtransistorsandfabricationofflexibledevices