Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature Dependence

Intrinsic hydrogenated amorphous silicon oxide (i-a-SiO:H) films were used as front and rear buffer layers in crystalline silicon heterojunction (c-Si-HJ) solar cells. The surface passivity and effective lifetime of these i-a-SiO:H films on an n-type silicon wafer were improved by increasing the CO2...

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Main Authors: Taweewat Krajangsang, Apichan Moollakorn, Sorapong Inthisang, Amornrat Limmanee, Kobsak Sriprapha, Nattaphong Boriraksantikul, Tianchai Taratiwat, Nirod Akarapanjavit, Jaran Sritharathikhun
Format: Article
Language:English
Published: Wiley 2014-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2014/251508
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author Taweewat Krajangsang
Apichan Moollakorn
Sorapong Inthisang
Amornrat Limmanee
Kobsak Sriprapha
Nattaphong Boriraksantikul
Tianchai Taratiwat
Nirod Akarapanjavit
Jaran Sritharathikhun
author_facet Taweewat Krajangsang
Apichan Moollakorn
Sorapong Inthisang
Amornrat Limmanee
Kobsak Sriprapha
Nattaphong Boriraksantikul
Tianchai Taratiwat
Nirod Akarapanjavit
Jaran Sritharathikhun
author_sort Taweewat Krajangsang
collection DOAJ
description Intrinsic hydrogenated amorphous silicon oxide (i-a-SiO:H) films were used as front and rear buffer layers in crystalline silicon heterojunction (c-Si-HJ) solar cells. The surface passivity and effective lifetime of these i-a-SiO:H films on an n-type silicon wafer were improved by increasing the CO2/SiH4 ratios in the films. Using i-a-SiO:H as the front and rear buffer layers in c-Si-HJ solar cells was investigated. The front i-a-SiO:H buffer layer thickness and the CO2/SiH4 ratio influenced the open-circuit voltage (Voc), fill factor (FF), and temperature coefficient (TC) of the c-Si-HJ solar cells. The highest total area efficiency obtained was 18.5% (Voc=700 mV, Jsc=33.5 mA/cm2, and FF=0.79). The TC normalized for this c-Si-HJ solar cell efficiency was −0.301%/°C.
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id doaj-art-56233849cb7d48d3898e24995737e2f3
institution Kabale University
issn 1110-662X
1687-529X
language English
publishDate 2014-01-01
publisher Wiley
record_format Article
series International Journal of Photoenergy
spelling doaj-art-56233849cb7d48d3898e24995737e2f32025-02-03T05:52:17ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2014-01-01201410.1155/2014/251508251508Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature DependenceTaweewat Krajangsang0Apichan Moollakorn1Sorapong Inthisang2Amornrat Limmanee3Kobsak Sriprapha4Nattaphong Boriraksantikul5Tianchai Taratiwat6Nirod Akarapanjavit7Jaran Sritharathikhun8Solar Energy Technology Laboratory (STL), National Electronics and Computer Technology Center (NECTEC), Pathumthani 12120, ThailandSolar Energy Technology Laboratory (STL), National Electronics and Computer Technology Center (NECTEC), Pathumthani 12120, ThailandSolar Energy Technology Laboratory (STL), National Electronics and Computer Technology Center (NECTEC), Pathumthani 12120, ThailandSolar Energy Technology Laboratory (STL), National Electronics and Computer Technology Center (NECTEC), Pathumthani 12120, ThailandSolar Energy Technology Laboratory (STL), National Electronics and Computer Technology Center (NECTEC), Pathumthani 12120, ThailandPTT Research & Technology Institute, PTT Public Company Limited, Phra Nakhon Si Ayutthaya 13170, ThailandPTT Research & Technology Institute, PTT Public Company Limited, Phra Nakhon Si Ayutthaya 13170, ThailandPTT Research & Technology Institute, PTT Public Company Limited, Phra Nakhon Si Ayutthaya 13170, ThailandSolar Energy Technology Laboratory (STL), National Electronics and Computer Technology Center (NECTEC), Pathumthani 12120, ThailandIntrinsic hydrogenated amorphous silicon oxide (i-a-SiO:H) films were used as front and rear buffer layers in crystalline silicon heterojunction (c-Si-HJ) solar cells. The surface passivity and effective lifetime of these i-a-SiO:H films on an n-type silicon wafer were improved by increasing the CO2/SiH4 ratios in the films. Using i-a-SiO:H as the front and rear buffer layers in c-Si-HJ solar cells was investigated. The front i-a-SiO:H buffer layer thickness and the CO2/SiH4 ratio influenced the open-circuit voltage (Voc), fill factor (FF), and temperature coefficient (TC) of the c-Si-HJ solar cells. The highest total area efficiency obtained was 18.5% (Voc=700 mV, Jsc=33.5 mA/cm2, and FF=0.79). The TC normalized for this c-Si-HJ solar cell efficiency was −0.301%/°C.http://dx.doi.org/10.1155/2014/251508
spellingShingle Taweewat Krajangsang
Apichan Moollakorn
Sorapong Inthisang
Amornrat Limmanee
Kobsak Sriprapha
Nattaphong Boriraksantikul
Tianchai Taratiwat
Nirod Akarapanjavit
Jaran Sritharathikhun
Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature Dependence
International Journal of Photoenergy
title Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature Dependence
title_full Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature Dependence
title_fullStr Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature Dependence
title_full_unstemmed Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature Dependence
title_short Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature Dependence
title_sort study of an amorphous silicon oxide buffer layer for p type microcrystalline silicon oxide n type crystalline silicon heterojunction solar cells and their temperature dependence
url http://dx.doi.org/10.1155/2014/251508
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