APA (7th ed.) Citation

NISHIZAWA, K., MATSUMOTO, A., NAKAGAWA, Y., SAKUMA, H., KOJIMA, Y., FUKUMURO, N., & YAE, S. Stress Analysis of the Interface Reaction Layer Between Ni–P Films and GaAs Substrate After Annealing. The Electrochemical Society of Japan.

Chicago Style (17th ed.) Citation

NISHIZAWA, Koichiro, Ayumu MATSUMOTO, Yasuyuki NAKAGAWA, Hitoshi SAKUMA, Yoshiki KOJIMA, Naoki FUKUMURO, and Shinji YAE. Stress Analysis of the Interface Reaction Layer Between Ni–P Films and GaAs Substrate After Annealing. The Electrochemical Society of Japan.

MLA (9th ed.) Citation

NISHIZAWA, Koichiro, et al. Stress Analysis of the Interface Reaction Layer Between Ni–P Films and GaAs Substrate After Annealing. The Electrochemical Society of Japan.