ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study

Al-doped ZnO thin films were deposited from two different targets. Ceramic targets were used in RF magnetron sputtering, whereas pulsed magnetron sputtering was used to grow films from powder targets. ZnO:Al films with different thicknesses were sputtered directly on soda-lime glass substrates. The...

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Main Author: Abdalla A. Alnajjar
Format: Article
Language:English
Published: Wiley 2012-01-01
Series:Advances in Condensed Matter Physics
Online Access:http://dx.doi.org/10.1155/2012/682125
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author Abdalla A. Alnajjar
author_facet Abdalla A. Alnajjar
author_sort Abdalla A. Alnajjar
collection DOAJ
description Al-doped ZnO thin films were deposited from two different targets. Ceramic targets were used in RF magnetron sputtering, whereas pulsed magnetron sputtering was used to grow films from powder targets. ZnO:Al films with different thicknesses were sputtered directly on soda-lime glass substrates. The film thickness was in the 0.04–2.0 μm range. The microstructure, such as the grain size and the texture, of the two differently grown ZnO:Al transparent conductive oxide films of different thickness, was studied using X-ray diffraction θ/2θ scans. The optical properties, such as the transmittance and reflectance, were measured using a UV-Vis-NIR spectrometer. Further, the sheet resistance, resistivity, carrier concentration, and Hall mobility of these ZnO:Al thin films were measured as a function of film thickness. These results obtained from the two different deposition techniques were compared and contrasted.
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spelling doaj-art-4d43eb44319d4d14a8796a2038d7fcc82025-02-03T05:52:04ZengWileyAdvances in Condensed Matter Physics1687-81081687-81242012-01-01201210.1155/2012/682125682125ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison StudyAbdalla A. Alnajjar0Applied Physics Department, College of Sciences, University of Sharjah, P.O. Box 27272, Sharjah, United Arab EmiratesAl-doped ZnO thin films were deposited from two different targets. Ceramic targets were used in RF magnetron sputtering, whereas pulsed magnetron sputtering was used to grow films from powder targets. ZnO:Al films with different thicknesses were sputtered directly on soda-lime glass substrates. The film thickness was in the 0.04–2.0 μm range. The microstructure, such as the grain size and the texture, of the two differently grown ZnO:Al transparent conductive oxide films of different thickness, was studied using X-ray diffraction θ/2θ scans. The optical properties, such as the transmittance and reflectance, were measured using a UV-Vis-NIR spectrometer. Further, the sheet resistance, resistivity, carrier concentration, and Hall mobility of these ZnO:Al thin films were measured as a function of film thickness. These results obtained from the two different deposition techniques were compared and contrasted.http://dx.doi.org/10.1155/2012/682125
spellingShingle Abdalla A. Alnajjar
ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study
Advances in Condensed Matter Physics
title ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study
title_full ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study
title_fullStr ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study
title_full_unstemmed ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study
title_short ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study
title_sort zno al grown by sputtering from two different target sources a comparison study
url http://dx.doi.org/10.1155/2012/682125
work_keys_str_mv AT abdallaaalnajjar znoalgrownbysputteringfromtwodifferenttargetsourcesacomparisonstudy