Ge, J., Tang, M., Wong, J., Zhang, Z., Dippell, T., Doerr, M., . . . Mueller, T. Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide. Wiley.
Chicago Style (17th ed.) CitationGe, Jia, et al. Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide. Wiley.
MLA (9th ed.) CitationGe, Jia, et al. Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide. Wiley.
Warning: These citations may not always be 100% accurate.