The Influence of the Ion Implantation of Au– to the Microstructure of the Amorphous-nanocrystaline AlN-TiB2-TiSi2

The Influence of the Ion Implantation of Au– to the Microstructure of the Amorphous-nanocrystaline AlN-TiB2-TiSi2

Direct measurements were performed using TEM, HRTEM, XRD and SEM with microanalysis. The results showed that the thermal annealing at 1300 С in air leads to the formation of nanoscale phases 1015 nm from AlN, AlB2, Al2O3 and TiO2. Moreover, the ion implantation of the negative ions Au– causes frag...

Full description

Saved in:
Bibliographic Details
Main Authors: K.V. Smyrnova, А.A. Demianenko, A.S. Radko, A.V. Pshyk, O.V. Kuzovlev, H. Amekura, K. Oyoshi, Y. Takeda
Format: Article
Language:English
Published: Sumy State University 2015-03-01
Series:Журнал нано- та електронної фізики
Subjects:
Ion implantation
Nanocrystallites
Amorphous structures
Vacancy Loops
Interstitial type
Online Access:http://jnep.sumdu.edu.ua/download/numbers/2015/1/articles/jnep_2015_V7_01040.pdf
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Direct measurements were performed using TEM, HRTEM, XRD and SEM with microanalysis. The results showed that the thermal annealing at 1300 С in air leads to the formation of nanoscale phases 1015 nm from AlN, AlB2, Al2O3 and TiO2. Moreover, the ion implantation of the negative ions Au– causes fragmentation (decrease) of the size of nanograins to 2-5 nm with the formation of Au– clusters. In addition, the ion implantation leads to the formation of an amorphous oxide film in the depth (at the undersurface layer) of the coating.
ISSN:2077-6772

Similar Items