Photocorrosion Mechanism of TiO2-Coated Photoanodes

Atomic layer deposition was used to coat CdS photoanodes with 7 nm thick TiO2 films to protect them from photocorrosion during photoelectrochemical water splitting. Photoelectrochemical measurements indicate that the TiO2 coating does not provide full protection against photocorrosion. The degradati...

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Main Authors: Arjen Didden, Philipp Hillebrand, Bernard Dam, Roel van de Krol
Format: Article
Language:English
Published: Wiley 2015-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2015/457980
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author Arjen Didden
Philipp Hillebrand
Bernard Dam
Roel van de Krol
author_facet Arjen Didden
Philipp Hillebrand
Bernard Dam
Roel van de Krol
author_sort Arjen Didden
collection DOAJ
description Atomic layer deposition was used to coat CdS photoanodes with 7 nm thick TiO2 films to protect them from photocorrosion during photoelectrochemical water splitting. Photoelectrochemical measurements indicate that the TiO2 coating does not provide full protection against photocorrosion. The degradation of the film initiates from small pinholes and shows oscillatory behavior that can be explained by an Avrami-type model for photocorrosion that is halfway between 2D and 3D etching. XPS analysis of corroded films indicates that a thin layer of CdS remains present on the surface of the corroded photoanode that is more resilient towards photocorrosion.
format Article
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institution Kabale University
issn 1110-662X
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language English
publishDate 2015-01-01
publisher Wiley
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series International Journal of Photoenergy
spelling doaj-art-4ad2d11102fc43bd90f649579d63a7312025-02-03T05:44:25ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2015-01-01201510.1155/2015/457980457980Photocorrosion Mechanism of TiO2-Coated PhotoanodesArjen Didden0Philipp Hillebrand1Bernard Dam2Roel van de Krol3Materials for Energy Conversion and Storage, Faculty of Applied Sciences, Delft University of Technology, Julianalaan 136, 2628 BL Delft, NetherlandsHelmholtz-Zentrum Berlin für Materialien und Energie GmbH, Institute for Solar Fuels, Hahn-Meitner-Platz 1, 14109 Berlin, GermanyMaterials for Energy Conversion and Storage, Faculty of Applied Sciences, Delft University of Technology, Julianalaan 136, 2628 BL Delft, NetherlandsMaterials for Energy Conversion and Storage, Faculty of Applied Sciences, Delft University of Technology, Julianalaan 136, 2628 BL Delft, NetherlandsAtomic layer deposition was used to coat CdS photoanodes with 7 nm thick TiO2 films to protect them from photocorrosion during photoelectrochemical water splitting. Photoelectrochemical measurements indicate that the TiO2 coating does not provide full protection against photocorrosion. The degradation of the film initiates from small pinholes and shows oscillatory behavior that can be explained by an Avrami-type model for photocorrosion that is halfway between 2D and 3D etching. XPS analysis of corroded films indicates that a thin layer of CdS remains present on the surface of the corroded photoanode that is more resilient towards photocorrosion.http://dx.doi.org/10.1155/2015/457980
spellingShingle Arjen Didden
Philipp Hillebrand
Bernard Dam
Roel van de Krol
Photocorrosion Mechanism of TiO2-Coated Photoanodes
International Journal of Photoenergy
title Photocorrosion Mechanism of TiO2-Coated Photoanodes
title_full Photocorrosion Mechanism of TiO2-Coated Photoanodes
title_fullStr Photocorrosion Mechanism of TiO2-Coated Photoanodes
title_full_unstemmed Photocorrosion Mechanism of TiO2-Coated Photoanodes
title_short Photocorrosion Mechanism of TiO2-Coated Photoanodes
title_sort photocorrosion mechanism of tio2 coated photoanodes
url http://dx.doi.org/10.1155/2015/457980
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AT philipphillebrand photocorrosionmechanismoftio2coatedphotoanodes
AT bernarddam photocorrosionmechanismoftio2coatedphotoanodes
AT roelvandekrol photocorrosionmechanismoftio2coatedphotoanodes