Machine Learning-Based Modeling of Hot Carrier Injection in 40 nm CMOS Transistors

This paper presents a machine-learning-based approach for the degradation modeling of hot carrier injection in metal-oxide-semiconductor field-effect transistors (MOSFETs). Stress measurement data have been employed at various stress conditions of both n- and p-MOSFETs with different channel geometr...

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Main Authors: Xhesila Xhafa, Ali Dogus Gungordu, Mustafa Berke Yelten
Format: Article
Language:English
Published: IEEE 2024-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Online Access:https://ieeexplore.ieee.org/document/10477498/
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author Xhesila Xhafa
Ali Dogus Gungordu
Mustafa Berke Yelten
author_facet Xhesila Xhafa
Ali Dogus Gungordu
Mustafa Berke Yelten
author_sort Xhesila Xhafa
collection DOAJ
description This paper presents a machine-learning-based approach for the degradation modeling of hot carrier injection in metal-oxide-semiconductor field-effect transistors (MOSFETs). Stress measurement data have been employed at various stress conditions of both n- and p-MOSFETs with different channel geometries. Gaussian process regression algorithm is preferred to model the post-stress characteristics of the drain-source current, the threshold voltage, and the drain-source conductance. The model outcomes have been compared with the actual measurements, and the accuracy of the generated models has been demonstrated across the test data by providing the appropriate statistics metrics. Finally, case studies of degradation estimation have been considered involving the usage of machine-learning-based models on transistors with different channel geometries or subjected to distinct stress conditions. The outcomes of this analysis reveal that the established models yield high accuracy in such contexts.
format Article
id doaj-art-42728040a3d64e968f403d6a587a2a49
institution Kabale University
issn 2168-6734
language English
publishDate 2024-01-01
publisher IEEE
record_format Article
series IEEE Journal of the Electron Devices Society
spelling doaj-art-42728040a3d64e968f403d6a587a2a492025-01-28T00:00:24ZengIEEEIEEE Journal of the Electron Devices Society2168-67342024-01-011228128810.1109/JEDS.2024.338057210477498Machine Learning-Based Modeling of Hot Carrier Injection in 40 nm CMOS TransistorsXhesila Xhafa0https://orcid.org/0000-0001-8951-7580Ali Dogus Gungordu1https://orcid.org/0000-0002-6921-8142Mustafa Berke Yelten2https://orcid.org/0000-0001-7482-0536LIRMM, CNRS, Montpellier, FranceDepartment of Electronics and Communications Engineering, Istanbul Technical University, Istanbul, TurkeyDepartment of Electronics and Communications Engineering, Istanbul Technical University, Istanbul, TurkeyThis paper presents a machine-learning-based approach for the degradation modeling of hot carrier injection in metal-oxide-semiconductor field-effect transistors (MOSFETs). Stress measurement data have been employed at various stress conditions of both n- and p-MOSFETs with different channel geometries. Gaussian process regression algorithm is preferred to model the post-stress characteristics of the drain-source current, the threshold voltage, and the drain-source conductance. The model outcomes have been compared with the actual measurements, and the accuracy of the generated models has been demonstrated across the test data by providing the appropriate statistics metrics. Finally, case studies of degradation estimation have been considered involving the usage of machine-learning-based models on transistors with different channel geometries or subjected to distinct stress conditions. The outcomes of this analysis reveal that the established models yield high accuracy in such contexts.https://ieeexplore.ieee.org/document/10477498/Reliabilityhot carrier injectionHCImachine learningMLGaussian process regressions
spellingShingle Xhesila Xhafa
Ali Dogus Gungordu
Mustafa Berke Yelten
Machine Learning-Based Modeling of Hot Carrier Injection in 40 nm CMOS Transistors
IEEE Journal of the Electron Devices Society
Reliability
hot carrier injection
HCI
machine learning
ML
Gaussian process regressions
title Machine Learning-Based Modeling of Hot Carrier Injection in 40 nm CMOS Transistors
title_full Machine Learning-Based Modeling of Hot Carrier Injection in 40 nm CMOS Transistors
title_fullStr Machine Learning-Based Modeling of Hot Carrier Injection in 40 nm CMOS Transistors
title_full_unstemmed Machine Learning-Based Modeling of Hot Carrier Injection in 40 nm CMOS Transistors
title_short Machine Learning-Based Modeling of Hot Carrier Injection in 40 nm CMOS Transistors
title_sort machine learning based modeling of hot carrier injection in 40 nm cmos transistors
topic Reliability
hot carrier injection
HCI
machine learning
ML
Gaussian process regressions
url https://ieeexplore.ieee.org/document/10477498/
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