Nanocrystalline Porous Hydrogen Storage Based on Vanadium and Titanium Nitrides

This review summarizes results of our study of the application of ion-beam assisted deposition (IBAD) technology for creation of nanoporous thin-film structures that can absorb more than 6 wt.% of hydrogen. Data of mathematical modeling are presented highlighting the structure formation and componen...

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Main Authors: A. Goncharov, A. Guglya, A. Kalchenko, E. Solopikhina, V. Vlasov, E. Lyubchenko
Format: Article
Language:English
Published: Wiley 2017-01-01
Series:Journal of Nanotechnology
Online Access:http://dx.doi.org/10.1155/2017/4106067
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author A. Goncharov
A. Guglya
A. Kalchenko
E. Solopikhina
V. Vlasov
E. Lyubchenko
author_facet A. Goncharov
A. Guglya
A. Kalchenko
E. Solopikhina
V. Vlasov
E. Lyubchenko
author_sort A. Goncharov
collection DOAJ
description This review summarizes results of our study of the application of ion-beam assisted deposition (IBAD) technology for creation of nanoporous thin-film structures that can absorb more than 6 wt.% of hydrogen. Data of mathematical modeling are presented highlighting the structure formation and component creation of the films during their deposition at the time of simultaneous bombardment by mixed beam of nitrogen and helium ions with energy of 30 keV. Results of high-resolution transmission electron microscopy revealed that VNx films consist of 150–200 nm particles, boundaries of which contain nanopores of 10–15 nm diameters. Particles themselves consist of randomly oriented 10–20 nm nanograins. Grain boundaries also contain nanopores (3–8 nm). Examination of the absorption characteristics of VNx, TiNx, and (V,Ti)Nx films showed that the amount of absorbed hydrogen depends very little on the chemical composition of films, but it is determined by the structure pore. The amount of absorbed hydrogen at 0.3 MPa and 20°C is 6-7 wt.%, whereas the bulk of hydrogen is accumulated in the grain boundaries and pores. Films begin to release hydrogen even at 50°C, and it is desorbed completely at the temperature range of 50–250°C. It was found that the electrical resistance of films during the hydrogen desorption increases 104 times.
format Article
id doaj-art-41b71785c82742d1b352580ffd8e940f
institution Kabale University
issn 1687-9503
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language English
publishDate 2017-01-01
publisher Wiley
record_format Article
series Journal of Nanotechnology
spelling doaj-art-41b71785c82742d1b352580ffd8e940f2025-02-03T05:57:12ZengWileyJournal of Nanotechnology1687-95031687-95112017-01-01201710.1155/2017/41060674106067Nanocrystalline Porous Hydrogen Storage Based on Vanadium and Titanium NitridesA. Goncharov0A. Guglya1A. Kalchenko2E. Solopikhina3V. Vlasov4E. Lyubchenko5National Science Center “Kharkov Institute of Physics and Technology”, 1 Akademicheskaya Str., Kharkov 61000, UkraineNational Science Center “Kharkov Institute of Physics and Technology”, 1 Akademicheskaya Str., Kharkov 61000, UkraineNational Science Center “Kharkov Institute of Physics and Technology”, 1 Akademicheskaya Str., Kharkov 61000, UkraineNational Science Center “Kharkov Institute of Physics and Technology”, 1 Akademicheskaya Str., Kharkov 61000, UkraineNational Science Center “Kharkov Institute of Physics and Technology”, 1 Akademicheskaya Str., Kharkov 61000, UkraineNational Technical University “Kharkov Polytechnic Institute”, 21 Kyrpychova Str., Kharkov 61002, UkraineThis review summarizes results of our study of the application of ion-beam assisted deposition (IBAD) technology for creation of nanoporous thin-film structures that can absorb more than 6 wt.% of hydrogen. Data of mathematical modeling are presented highlighting the structure formation and component creation of the films during their deposition at the time of simultaneous bombardment by mixed beam of nitrogen and helium ions with energy of 30 keV. Results of high-resolution transmission electron microscopy revealed that VNx films consist of 150–200 nm particles, boundaries of which contain nanopores of 10–15 nm diameters. Particles themselves consist of randomly oriented 10–20 nm nanograins. Grain boundaries also contain nanopores (3–8 nm). Examination of the absorption characteristics of VNx, TiNx, and (V,Ti)Nx films showed that the amount of absorbed hydrogen depends very little on the chemical composition of films, but it is determined by the structure pore. The amount of absorbed hydrogen at 0.3 MPa and 20°C is 6-7 wt.%, whereas the bulk of hydrogen is accumulated in the grain boundaries and pores. Films begin to release hydrogen even at 50°C, and it is desorbed completely at the temperature range of 50–250°C. It was found that the electrical resistance of films during the hydrogen desorption increases 104 times.http://dx.doi.org/10.1155/2017/4106067
spellingShingle A. Goncharov
A. Guglya
A. Kalchenko
E. Solopikhina
V. Vlasov
E. Lyubchenko
Nanocrystalline Porous Hydrogen Storage Based on Vanadium and Titanium Nitrides
Journal of Nanotechnology
title Nanocrystalline Porous Hydrogen Storage Based on Vanadium and Titanium Nitrides
title_full Nanocrystalline Porous Hydrogen Storage Based on Vanadium and Titanium Nitrides
title_fullStr Nanocrystalline Porous Hydrogen Storage Based on Vanadium and Titanium Nitrides
title_full_unstemmed Nanocrystalline Porous Hydrogen Storage Based on Vanadium and Titanium Nitrides
title_short Nanocrystalline Porous Hydrogen Storage Based on Vanadium and Titanium Nitrides
title_sort nanocrystalline porous hydrogen storage based on vanadium and titanium nitrides
url http://dx.doi.org/10.1155/2017/4106067
work_keys_str_mv AT agoncharov nanocrystallineporoushydrogenstoragebasedonvanadiumandtitaniumnitrides
AT aguglya nanocrystallineporoushydrogenstoragebasedonvanadiumandtitaniumnitrides
AT akalchenko nanocrystallineporoushydrogenstoragebasedonvanadiumandtitaniumnitrides
AT esolopikhina nanocrystallineporoushydrogenstoragebasedonvanadiumandtitaniumnitrides
AT vvlasov nanocrystallineporoushydrogenstoragebasedonvanadiumandtitaniumnitrides
AT elyubchenko nanocrystallineporoushydrogenstoragebasedonvanadiumandtitaniumnitrides