APA (7th ed.) Citation

Kumar, A., Agarwal, P., Gupta, S., Sharma, A., Kumar, D., & Shekhar, C. Fabrication of Low-Roughness Au/Ti/ SiO2/Si Substrates for Nanopatterning of 16-Mercapto Hexadecanoic Acid (MHA) by Dip-Pen-Nanolithography. Sumy State University.

Chicago Style (17th ed.) Citation

Kumar, A., P.B Agarwal, S.K Gupta, A.K Sharma, D. Kumar, and Chandra Shekhar. Fabrication of Low-Roughness Au/Ti/ SiO2/Si Substrates for Nanopatterning of 16-Mercapto Hexadecanoic Acid (MHA) by Dip-Pen-Nanolithography. Sumy State University.

MLA (9th ed.) Citation

Kumar, A., et al. Fabrication of Low-Roughness Au/Ti/ SiO2/Si Substrates for Nanopatterning of 16-Mercapto Hexadecanoic Acid (MHA) by Dip-Pen-Nanolithography. Sumy State University.