The Morphology of Ordered Block Copolymer Patterns as Probed by High Resolution Imaging
The microphase separation of block copolymer (BCP) thin films can afford a simple and cost-effective means to studying nanopattern surfaces, and especially the fabrication of nanocircuitry. However, because of complex interface effects and other complications, their 3D morphology, which is often cri...
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| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
2014-09-01
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| Series: | Nanomaterials and Nanotechnology |
| Subjects: | |
| Online Access: | http://www.intechopen.com/journals/nanomaterials_and_nanotechnology/the-morphology-of-ordered-block-copolymer-patterns-as-probed-by-high-resolution-imaging |
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| Summary: | The microphase separation of block copolymer
(BCP) thin films can afford a simple and cost-effective
means to studying nanopattern surfaces, and especially
the fabrication of nanocircuitry. However, because of
complex interface effects and other complications, their
3D morphology, which is often critical for application,
can be more complex than first thought. Here, we
describe how emerging microscopic methods may be
used to study complex BCP patterns and reveal their rich
detail. These methods include helium ion microscopy
(HIM) and high resolution x-section transmission electron
microscopy (XTEM), and complement conventional
secondary electron and atomic force microscopies (SEM
and TEM). These techniques reveal that these structures
are quite different to what might be expected. We
illustrate the advances in the understanding of BCP
thin film morphology in several systems, which
result from this characterization. The systems described
include symmetric, lamellar forming polystyrene-bpolymethylmethacrylate
(PS-b-PMMA), cylinder forming
polystyrene-b-polydimethylsiloxane (PS-b-PDMS), as well
as lamellar and cylinder forming patterns of polystyreneb-
polyethylene oxide (PS-b-PEO) and polystyrene-b-poly-
4-vinylpyridine (PS-b-P4VP). Each of these systems
exhibits more complex arrangements than might be first
thought. Finding and developing techniques whereby
complex morphologies, particularly at very small
dimensions, can be determined is critical to the practical
use of these materials in many applications. The
importance of quantifying these complex morphologies
has implications for their use in integrated circuit
manufacture, where they are being explored as
alternative pattern forming methods to conventional UV
lithography. |
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| ISSN: | 1847-9804 |