A Cu(I)-Based MOF with Nonlinear Optical Properties and a Favorable Optical Limit Threshold
The exploitation of high-performance third-order nonlinear optical (NLO) materials that have a favorable optical limit (OL) threshold is essential due to a rise in the application of ultra-intense lasers. In this study, a Cu-based MOF (denoted as Cu-bpy) was synthesized, and its third-order NLO and...
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Main Authors: | , , , , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2025-01-01
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Series: | Nanomaterials |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-4991/15/2/145 |
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Summary: | The exploitation of high-performance third-order nonlinear optical (NLO) materials that have a favorable optical limit (OL) threshold is essential due to a rise in the application of ultra-intense lasers. In this study, a Cu-based MOF (denoted as Cu-bpy) was synthesized, and its third-order NLO and OL properties were investigated using the Z-scan technique with the nanosecond laser pulse excitation set at 532 nm. The Cu-bpy exhibits a typical rate of reverse saturable absorption (RSA) with a third-order nonlinear absorption coefficient of 100 cm GW<sup>−1</sup> and a favorable OL threshold of 0.75 J cm<sup>−2</sup> (at a concentration of 1.6 mg mL<sup>−1</sup>), which is lower than that of most NLO materials that have been reported on so far. In addition, a DFT calculation was performed and was in agreement with our experimental results. Furthermore, the mechanism of the third-order NLO properties was illustrated as one-photon absorption (1PA). These results investigate the relationship between the structure and the nonlinear optical properties of Cu-bpy, and provide an experimental and theoretical basis for its use in optical limiting applications. |
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ISSN: | 2079-4991 |