Effect of Sputtering Process Parameters on Physical Properties and Electron Emission Level of Titanium Nitride Films

Titanium nitride (TiN) is a typical inorganic compound capable of achieving resistance modulation by adjusting the element ratio. In this work, to deeply investigate the resistance-tunable characteristics and electron emission properties of TiN, we prepared 10 sets of TiN films by adjusting the magn...

Full description

Saved in:
Bibliographic Details
Main Authors: Yang Xia, Dan Wang
Format: Article
Language:English
Published: MDPI AG 2025-06-01
Series:Inorganics
Subjects:
Online Access:https://www.mdpi.com/2304-6740/13/6/201
Tags: Add Tag
No Tags, Be the first to tag this record!