UHV – Deposited Amorphous Tantalum and Tantalum–Nickel Films
Saved in:
Main Authors: | Günther Menzel, Alfred Schäfer |
---|---|
Format: | Article |
Language: | English |
Published: |
Wiley
1977-01-01
|
Series: | Active and Passive Electronic Components |
Online Access: | http://dx.doi.org/10.1155/APEC.4.29 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Influence of Electrolytes in the Electrical Characteristics of Anodic Films on Tantalum
by: J. M. Martínez-Duart, et al.
Published: (1981-01-01) -
Properties of Nickel Films Prepared by R.F. Sputtering and Interdiffusion Analysis of Ta2N–Ni Films
by: G. Morillot, et al.
Published: (1980-01-01) -
Low Frequency Characteristics of TiO2(Rutile)–Glass Thick Films
by: B. Rzasa, et al.
Published: (1977-01-01) -
Tantalum Thin Film Capacitors With Various Types of Counterelectrodes
by: R. May, et al.
Published: (1980-01-01) -
Failure Mechanisms in Wet Tantalum Capacitors
by: D. Hayward
Published: (1976-01-01)