Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation
Femtosecond laser ablation-driven periodic surface structuring offers a promising method for large-scale and high-throughput nanolithography technique. However, the self-organized periodic structures typically manifest constraints in terms of tunable period and depth, as well as suboptimal regularit...
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| Format: | Article |
| Language: | English |
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American Association for the Advancement of Science (AAAS)
2025-01-01
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| Series: | Ultrafast Science |
| Online Access: | https://spj.science.org/doi/10.34133/ultrafastscience.0084 |
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| author | Liping Shi Ji Yan Shuyao Zhang Panpan Niu Jiao Geng Günter Steinmeyer |
| author_facet | Liping Shi Ji Yan Shuyao Zhang Panpan Niu Jiao Geng Günter Steinmeyer |
| author_sort | Liping Shi |
| collection | DOAJ |
| description | Femtosecond laser ablation-driven periodic surface structuring offers a promising method for large-scale and high-throughput nanolithography technique. However, the self-organized periodic structures typically manifest constraints in terms of tunable period and depth, as well as suboptimal regularity, which restricts their broader application potential. Here, in terms of a rarely explored laser-induced photochemical mechanism for nonablative structuring, we demonstrate manufacturing of sub-wavelength oxidative grating structures on silicon films with active structural modulation. In this scenario, the plasmonic field plays a pivotal role in dragging oxygen ions from surface into the silicon, greatly speeding up oxidation rates. While high oxygen doping levels can already be achieved with single-pulse exposure, far superior results are obtained with the application of 40-MHz burst mode pulse trains, mitigating the formation of excessively large nanocrystallites. Furthermore, it is revealed that the periodicity and modulation depth of laser-writing nanograting are both dependent on the number of pulse per burst. This offers a convenient scheme for actively controlling laser plasmonic lithography. |
| format | Article |
| id | doaj-art-2cddb22280a246adb756ac9a1e8d2a63 |
| institution | Kabale University |
| issn | 2765-8791 |
| language | English |
| publishDate | 2025-01-01 |
| publisher | American Association for the Advancement of Science (AAAS) |
| record_format | Article |
| series | Ultrafast Science |
| spelling | doaj-art-2cddb22280a246adb756ac9a1e8d2a632025-02-06T08:00:30ZengAmerican Association for the Advancement of Science (AAAS)Ultrafast Science2765-87912025-01-01510.34133/ultrafastscience.0084Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural ModulationLiping Shi0Ji Yan1Shuyao Zhang2Panpan Niu3Jiao Geng4Günter Steinmeyer5Hangzhou Institute of Technology, Xidian University, Hangzhou 311200, China.Hangzhou Institute of Technology, Xidian University, Hangzhou 311200, China.Hangzhou Institute of Technology, Xidian University, Hangzhou 311200, China.Hangzhou Institute of Technology, Xidian University, Hangzhou 311200, China.Hangzhou Institute of Technology, Xidian University, Hangzhou 311200, China.Max Born Institute for Nonlinear Optics and Short Pulse Spectroscopy, Berlin 12489, Germany.Femtosecond laser ablation-driven periodic surface structuring offers a promising method for large-scale and high-throughput nanolithography technique. However, the self-organized periodic structures typically manifest constraints in terms of tunable period and depth, as well as suboptimal regularity, which restricts their broader application potential. Here, in terms of a rarely explored laser-induced photochemical mechanism for nonablative structuring, we demonstrate manufacturing of sub-wavelength oxidative grating structures on silicon films with active structural modulation. In this scenario, the plasmonic field plays a pivotal role in dragging oxygen ions from surface into the silicon, greatly speeding up oxidation rates. While high oxygen doping levels can already be achieved with single-pulse exposure, far superior results are obtained with the application of 40-MHz burst mode pulse trains, mitigating the formation of excessively large nanocrystallites. Furthermore, it is revealed that the periodicity and modulation depth of laser-writing nanograting are both dependent on the number of pulse per burst. This offers a convenient scheme for actively controlling laser plasmonic lithography.https://spj.science.org/doi/10.34133/ultrafastscience.0084 |
| spellingShingle | Liping Shi Ji Yan Shuyao Zhang Panpan Niu Jiao Geng Günter Steinmeyer Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation Ultrafast Science |
| title | Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation |
| title_full | Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation |
| title_fullStr | Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation |
| title_full_unstemmed | Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation |
| title_short | Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation |
| title_sort | burst laser driven plasmonic photochemical nanolithography of silicon with active structural modulation |
| url | https://spj.science.org/doi/10.34133/ultrafastscience.0084 |
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