Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation
Femtosecond laser ablation-driven periodic surface structuring offers a promising method for large-scale and high-throughput nanolithography technique. However, the self-organized periodic structures typically manifest constraints in terms of tunable period and depth, as well as suboptimal regularit...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
American Association for the Advancement of Science (AAAS)
2025-01-01
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| Series: | Ultrafast Science |
| Online Access: | https://spj.science.org/doi/10.34133/ultrafastscience.0084 |
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| Summary: | Femtosecond laser ablation-driven periodic surface structuring offers a promising method for large-scale and high-throughput nanolithography technique. However, the self-organized periodic structures typically manifest constraints in terms of tunable period and depth, as well as suboptimal regularity, which restricts their broader application potential. Here, in terms of a rarely explored laser-induced photochemical mechanism for nonablative structuring, we demonstrate manufacturing of sub-wavelength oxidative grating structures on silicon films with active structural modulation. In this scenario, the plasmonic field plays a pivotal role in dragging oxygen ions from surface into the silicon, greatly speeding up oxidation rates. While high oxygen doping levels can already be achieved with single-pulse exposure, far superior results are obtained with the application of 40-MHz burst mode pulse trains, mitigating the formation of excessively large nanocrystallites. Furthermore, it is revealed that the periodicity and modulation depth of laser-writing nanograting are both dependent on the number of pulse per burst. This offers a convenient scheme for actively controlling laser plasmonic lithography. |
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| ISSN: | 2765-8791 |