Inverse design of high-NA metalens for maskless lithography
We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry. First, we derive a computational upper bound for a unit-cell-based ax...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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De Gruyter
2023-02-01
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| Series: | Nanophotonics |
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| Online Access: | https://doi.org/10.1515/nanoph-2022-0761 |
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| author | Chung Haejun Zhang Feng Li Hao Miller Owen D. Smith Henry I. |
| author_facet | Chung Haejun Zhang Feng Li Hao Miller Owen D. Smith Henry I. |
| author_sort | Chung Haejun |
| collection | DOAJ |
| description | We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry. First, we derive a computational upper bound for a unit-cell-based axisymmetric metalens. Then, we demonstrate a fabrication-compatible inverse-designed metalens with 85.50% transmission normalized focusing efficiency at 0.6 numerical aperture at 405 nm wavelength; a higher efficiency than a theoretical gradient index lens design (79.98%). We also demonstrate experimental validation for our axisymmetric inverse-designed metalens via electron beam lithography. Metalens-based maskless lithography may open a new way of achieving low-cost, large-area nanofabrication. |
| format | Article |
| id | doaj-art-2b71ef6586224907a1707f8ab2832782 |
| institution | Kabale University |
| issn | 2192-8614 |
| language | English |
| publishDate | 2023-02-01 |
| publisher | De Gruyter |
| record_format | Article |
| series | Nanophotonics |
| spelling | doaj-art-2b71ef6586224907a1707f8ab28327822025-02-02T15:46:12ZengDe GruyterNanophotonics2192-86142023-02-0112132371238110.1515/nanoph-2022-0761Inverse design of high-NA metalens for maskless lithographyChung Haejun0Zhang Feng1Li Hao2Miller Owen D.3Smith Henry I.4Department of Electronic Engineering, Hanyang University, Seoul, 04763, South KoreaLumArray, Inc., 15 Ward Street, Somerville, MA02143, USADepartment of Applied Physics and Energy Sciences Institute, Yale University, New Haven, CT06511, USADepartment of Applied Physics and Energy Sciences Institute, Yale University, New Haven, CT06511, USALumArray, Inc., 15 Ward Street, Somerville, MA02143, USAWe demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry. First, we derive a computational upper bound for a unit-cell-based axisymmetric metalens. Then, we demonstrate a fabrication-compatible inverse-designed metalens with 85.50% transmission normalized focusing efficiency at 0.6 numerical aperture at 405 nm wavelength; a higher efficiency than a theoretical gradient index lens design (79.98%). We also demonstrate experimental validation for our axisymmetric inverse-designed metalens via electron beam lithography. Metalens-based maskless lithography may open a new way of achieving low-cost, large-area nanofabrication.https://doi.org/10.1515/nanoph-2022-0761inverse designmaskless lithographymetalens |
| spellingShingle | Chung Haejun Zhang Feng Li Hao Miller Owen D. Smith Henry I. Inverse design of high-NA metalens for maskless lithography Nanophotonics inverse design maskless lithography metalens |
| title | Inverse design of high-NA metalens for maskless lithography |
| title_full | Inverse design of high-NA metalens for maskless lithography |
| title_fullStr | Inverse design of high-NA metalens for maskless lithography |
| title_full_unstemmed | Inverse design of high-NA metalens for maskless lithography |
| title_short | Inverse design of high-NA metalens for maskless lithography |
| title_sort | inverse design of high na metalens for maskless lithography |
| topic | inverse design maskless lithography metalens |
| url | https://doi.org/10.1515/nanoph-2022-0761 |
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