Haejun, C., Feng, Z., Hao, L., D, M. O., & I, S. H. Inverse design of high-NA metalens for maskless lithography. De Gruyter.
Chicago Style (17th ed.) CitationHaejun, Chung, Zhang Feng, Li Hao, Miller Owen D, and Smith Henry I. Inverse Design of High-NA Metalens for Maskless Lithography. De Gruyter.
MLA (9th ed.) CitationHaejun, Chung, et al. Inverse Design of High-NA Metalens for Maskless Lithography. De Gruyter.
Warning: These citations may not always be 100% accurate.