Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiC
We motivate our study by simulating the particle transport of a thin film deposition process done by PVD (physical vapor deposition) processes. In this paper we present a new model taken into account a self-consistent electrostatic-particle in cell model with low density Argon plasma. The collision...
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| Format: | Article |
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Wiley
2011-01-01
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| Series: | Modelling and Simulation in Engineering |
| Online Access: | http://dx.doi.org/10.1155/2011/931415 |
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| author | Jürgen Geiser Sven Blankenburg |
| author_facet | Jürgen Geiser Sven Blankenburg |
| author_sort | Jürgen Geiser |
| collection | DOAJ |
| description | We motivate our study by simulating the particle transport of a thin film deposition process done by PVD (physical vapor deposition)
processes. In this paper we present a new model taken into account a self-consistent electrostatic-particle in cell model with low density Argon plasma. The collision model are based of Monte Carlo simulations is discussed for DC sputtering in lower pressure regimes. In order to simulate transport phenomena within sputtering processes realistically, a spatial and temporal knowledge of the plasma density and electrostatic field configuration is needed. Due to relatively low plasma densities, continuum fluid equations are not applicable. We propose instead a Particle-in-cell (PIC) method, which allows the study of plasma behavior by computing the trajectories of finite-size particles under the action of an external and self-consistent electric field defined in a grid of points. |
| format | Article |
| id | doaj-art-2a7e7f35cab04d58a2fb1bd4ce7323dc |
| institution | Kabale University |
| issn | 1687-5591 1687-5605 |
| language | English |
| publishDate | 2011-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Modelling and Simulation in Engineering |
| spelling | doaj-art-2a7e7f35cab04d58a2fb1bd4ce7323dc2025-02-03T06:01:23ZengWileyModelling and Simulation in Engineering1687-55911687-56052011-01-01201110.1155/2011/931415931415Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiCJürgen Geiser0Sven Blankenburg1Department of Mathematics, Humboldt-University of Berlin, Unter den Linden 6, 10099 Berlin, GermanyDepartment of Physics, Humboldt-University of Berlin, 10099 Berlin, GermanyWe motivate our study by simulating the particle transport of a thin film deposition process done by PVD (physical vapor deposition) processes. In this paper we present a new model taken into account a self-consistent electrostatic-particle in cell model with low density Argon plasma. The collision model are based of Monte Carlo simulations is discussed for DC sputtering in lower pressure regimes. In order to simulate transport phenomena within sputtering processes realistically, a spatial and temporal knowledge of the plasma density and electrostatic field configuration is needed. Due to relatively low plasma densities, continuum fluid equations are not applicable. We propose instead a Particle-in-cell (PIC) method, which allows the study of plasma behavior by computing the trajectories of finite-size particles under the action of an external and self-consistent electric field defined in a grid of points.http://dx.doi.org/10.1155/2011/931415 |
| spellingShingle | Jürgen Geiser Sven Blankenburg Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiC Modelling and Simulation in Engineering |
| title | Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiC |
| title_full | Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiC |
| title_fullStr | Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiC |
| title_full_unstemmed | Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiC |
| title_short | Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiC |
| title_sort | plasma and bias modeling self consistent electrostatic particle in cell with low density argon plasma for tic |
| url | http://dx.doi.org/10.1155/2011/931415 |
| work_keys_str_mv | AT jurgengeiser plasmaandbiasmodelingselfconsistentelectrostaticparticleincellwithlowdensityargonplasmafortic AT svenblankenburg plasmaandbiasmodelingselfconsistentelectrostaticparticleincellwithlowdensityargonplasmafortic |