Local Fermi Level Engineering in 2D‐MoS2 Realized via Microcontact Printing of Self‐Assembled Monolayers for Next‐Generation Electronics
Abstract Silicon‐based technology is approaching scalability limits due to severe short‐channel effects arising from its intrinsic bulk properties. In contrast, two‐dimensional (2D) transition metal dichalcogenides (TMDCs) exhibit remarkable resilience to these effects because of their atomic‐scale...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2025-08-01
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| Series: | Advanced Electronic Materials |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/aelm.202500081 |
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