Enhanced Light Scattering by Preferred Orientation Control of Ga Doped ZnO Films Prepared through MOCVD

We have explored the effective approach to fabricate GZO/ZnO films that can make the pyramidal surface structures of GZO films for effective light scattering by employing a low temperature ZnO buffer layer prior to high temperature GZO film growth. The GZO thin films exhibit the typical preferred gr...

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Main Authors: Long Giang Bach, Nam Giang Nguyen, Van Thi Thanh Ho
Format: Article
Language:English
Published: Wiley 2016-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2016/1217576
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_version_ 1832567157475508224
author Long Giang Bach
Nam Giang Nguyen
Van Thi Thanh Ho
author_facet Long Giang Bach
Nam Giang Nguyen
Van Thi Thanh Ho
author_sort Long Giang Bach
collection DOAJ
description We have explored the effective approach to fabricate GZO/ZnO films that can make the pyramidal surface structures of GZO films for effective light scattering by employing a low temperature ZnO buffer layer prior to high temperature GZO film growth. The GZO thin films exhibit the typical preferred growth orientations along the (002) crystallographic direction at deposition temperature of 400°C and SEM showed that column-like granule structure with planar surface was formed. In contrast, GZO films with a pyramidal texture surface were successfully developed by the control of (110) preferred orientation. We found that the light diffuse transmittance of the film with a GZO (800 nm)/ZnO (766 nm) exhibited 13% increase at 420 nm wavelength due to the formed large grain size of the pyramidal texture surface. Thus, the obtained GZO films deposited over ZnO buffer layer have high potential for use as front TCO layers in Si-based thin film solar cells. These results could develop the potential way to fabricate TCO based ZnO thin film using MOCVD or sputtering techniques by depositing a low temperature ZnO layer to serve as a template for high temperature GZO film growth. The GZO films exhibited satisfactory optoelectric properties.
format Article
id doaj-art-257844dde3424c2aa810152f63db87db
institution Kabale University
issn 1110-662X
1687-529X
language English
publishDate 2016-01-01
publisher Wiley
record_format Article
series International Journal of Photoenergy
spelling doaj-art-257844dde3424c2aa810152f63db87db2025-02-03T01:02:07ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2016-01-01201610.1155/2016/12175761217576Enhanced Light Scattering by Preferred Orientation Control of Ga Doped ZnO Films Prepared through MOCVDLong Giang Bach0Nam Giang Nguyen1Van Thi Thanh Ho2NTT Institute of Hi-Technology, Nguyen Tat Thanh University, Ho Chi Minh City 70000, VietnamThin Film Solar Cells Laboratory, Department of Chemical Engineering, National Taiwan University of Science and Technology (NTUST), Taipei City 106, TaiwanHo Chi Minh City University of Natural Resources and Environment (HCMUNRE), Ho Chi Minh City 70000, VietnamWe have explored the effective approach to fabricate GZO/ZnO films that can make the pyramidal surface structures of GZO films for effective light scattering by employing a low temperature ZnO buffer layer prior to high temperature GZO film growth. The GZO thin films exhibit the typical preferred growth orientations along the (002) crystallographic direction at deposition temperature of 400°C and SEM showed that column-like granule structure with planar surface was formed. In contrast, GZO films with a pyramidal texture surface were successfully developed by the control of (110) preferred orientation. We found that the light diffuse transmittance of the film with a GZO (800 nm)/ZnO (766 nm) exhibited 13% increase at 420 nm wavelength due to the formed large grain size of the pyramidal texture surface. Thus, the obtained GZO films deposited over ZnO buffer layer have high potential for use as front TCO layers in Si-based thin film solar cells. These results could develop the potential way to fabricate TCO based ZnO thin film using MOCVD or sputtering techniques by depositing a low temperature ZnO layer to serve as a template for high temperature GZO film growth. The GZO films exhibited satisfactory optoelectric properties.http://dx.doi.org/10.1155/2016/1217576
spellingShingle Long Giang Bach
Nam Giang Nguyen
Van Thi Thanh Ho
Enhanced Light Scattering by Preferred Orientation Control of Ga Doped ZnO Films Prepared through MOCVD
International Journal of Photoenergy
title Enhanced Light Scattering by Preferred Orientation Control of Ga Doped ZnO Films Prepared through MOCVD
title_full Enhanced Light Scattering by Preferred Orientation Control of Ga Doped ZnO Films Prepared through MOCVD
title_fullStr Enhanced Light Scattering by Preferred Orientation Control of Ga Doped ZnO Films Prepared through MOCVD
title_full_unstemmed Enhanced Light Scattering by Preferred Orientation Control of Ga Doped ZnO Films Prepared through MOCVD
title_short Enhanced Light Scattering by Preferred Orientation Control of Ga Doped ZnO Films Prepared through MOCVD
title_sort enhanced light scattering by preferred orientation control of ga doped zno films prepared through mocvd
url http://dx.doi.org/10.1155/2016/1217576
work_keys_str_mv AT longgiangbach enhancedlightscatteringbypreferredorientationcontrolofgadopedznofilmspreparedthroughmocvd
AT namgiangnguyen enhancedlightscatteringbypreferredorientationcontrolofgadopedznofilmspreparedthroughmocvd
AT vanthithanhho enhancedlightscatteringbypreferredorientationcontrolofgadopedznofilmspreparedthroughmocvd