Performance optimization of a microwave-coupled plasma-based ultralow-energy ECR ion source for silicon nanostructuring
This paper presents a comprehensive optimization of key parameters for generating ion beams in a microwave-coupled plasma-based ultralow-energy electron cyclotron resonance ion source, generally used for nanostructuring solid surfaces. The investigation focuses on developing, accelerating, and extra...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Beilstein-Institut
2025-03-01
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| Series: | Beilstein Journal of Nanotechnology |
| Subjects: | |
| Online Access: | https://doi.org/10.3762/bjnano.16.37 |
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