APA (7th ed.) Citation

Mukherjee, J., Mollick, S. A., Basu, T., & Som, T. Performance optimization of a microwave-coupled plasma-based ultralow-energy ECR ion source for silicon nanostructuring. Beilstein-Institut.

Chicago Style (17th ed.) Citation

Mukherjee, Joy, Safiul Alam Mollick, Tanmoy Basu, and Tapobrata Som. Performance Optimization of a Microwave-coupled Plasma-based Ultralow-energy ECR Ion Source for Silicon Nanostructuring. Beilstein-Institut.

MLA (9th ed.) Citation

Mukherjee, Joy, et al. Performance Optimization of a Microwave-coupled Plasma-based Ultralow-energy ECR Ion Source for Silicon Nanostructuring. Beilstein-Institut.