Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction

Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction

Atomically thin lubrication materials with anti-friction properties are crucial for reducing energy consumption and extending the service life of micro/nanoelectromechanical systems (MEMS/NEMS). However, achieving atomically thin films with ultra-low friction properties at the atomic/nanoscale even...

Full description

Saved in:
Bibliographic Details
Main Authors: Xinjian He, Tongtong Yu, Zishuai Wu, Changhe Du, Haoyu Deng, Yongkang Zhao, Shuang Li, Yange Feng, Liqiang Zhang, Zhinan Zhang, Daoai Wang
Format: Article
Language:English
Published: Tsinghua University Press 2025-04-01
Series:Friction
Subjects:
chemical vapor deposition (cvd)
mos2
ultra-thin
ultra-low friction
interface interaction
Online Access:https://www.sciopen.com/article/10.26599/FRICT.2025.9440936
Tags: Add Tag
No Tags, Be the first to tag this record!

Internet

https://www.sciopen.com/article/10.26599/FRICT.2025.9440936

Similar Items